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<article article-type="research-article" dtd-version="1.1" specific-use="sps-1.9" xml:lang="en"
	xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">
	<front>
		<journal-meta>
			<journal-id journal-id-type="publisher-id">sv</journal-id>
			<journal-title-group>
				<journal-title>Superficies y vacío</journal-title>
				<abbrev-journal-title abbrev-type="publisher">Superf. vacío</abbrev-journal-title>
			</journal-title-group>
			<issn pub-type="ppub">1665-3521</issn>
			<publisher>
				<publisher-name>Sociedad Mexicana de Ciencia y Tecnología de Superficies y
					Materiales A.C.</publisher-name>
			</publisher>
		</journal-meta>
		<article-meta>
			<article-id pub-id-type="publisher-id">00003</article-id>
			<article-categories>
				<subj-group subj-group-type="heading">
					<subject>Research Papers</subject>
				</subj-group>
			</article-categories>
			<title-group>
				<article-title>Influence of active layer thickness, device architecture and
					degradation effects on the contact resistance in organic thin film
					transistors</article-title>
			</title-group>
			<contrib-group>
				<contrib contrib-type="author">
					<name>
						<surname>Pons-Flores</surname>
						<given-names>C.A.</given-names>
					</name>
					<xref ref-type="aff" rid="aff1"><sup>1</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Mejía</surname>
						<given-names>I.</given-names>
					</name>
					<xref ref-type="aff" rid="aff2"><sup>2</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Quevedo-López</surname>
						<given-names>M.A.</given-names>
					</name>
					<xref ref-type="aff" rid="aff2"><sup>2</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Alvarado-Beltran</surname>
						<given-names>C.</given-names>
					</name>
					<xref ref-type="aff" rid="aff3"><sup>3</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Reséndiz</surname>
						<given-names>L.M.</given-names>
					</name>
					<xref ref-type="aff" rid="aff4"><sup>4</sup></xref>
					<xref ref-type="corresp" rid="c1">*</xref>
				</contrib>
			</contrib-group>
			<aff id="aff1">
				<label>1</label>
				<institution content-type="original">Departamento de Ingeniería Eléctrica, Centro de
					Investigación y de Estudios Avanzados del IPN Gustavo A. Madero, Cd. de México,
					07360, México.</institution>
				<institution content-type="normalized">Instituto Politécnico Nacional</institution>
				<institution content-type="orgdiv2">Departamento de Ingeniería
					Eléctrica</institution>
				<institution content-type="orgdiv1">Centro de Investigación y de Estudios
					Avanzados</institution>
				<institution content-type="orgname">IPN</institution>
				<addr-line>
					<state>Cd. de México</state>
					<postal-code>07360</postal-code>
				</addr-line>
				<country country="MX">México</country>
			</aff>
			<aff id="aff2">
				<label>2</label>
				<institution content-type="original">Department of Materials Science and
					Engineering, University of Texas at Dallas Richardson, TX 75080,
					USA.</institution>
				<institution content-type="normalized">University of Texas</institution>
				<institution content-type="orgdiv1">Department of Materials Science and
					Engineering</institution>
				<institution content-type="orgname">University of Texas at Dallas</institution>
				<addr-line>
					<city>Richardson</city>
					<state>TX</state>
					<postal-code>75080</postal-code>
				</addr-line>
				<country country="US">USA</country>
			</aff>
			<aff id="aff3">
				<label>3</label>
				<institution content-type="original">Universidad Autónoma de Sinaloa Los Mochis,
					Sinaloa, 81200, México.</institution>
				<institution content-type="normalized">Universidad Autónoma de Sinaloa</institution>
				<institution content-type="orgname">Universidad Autónoma de Sinaloa</institution>
				<addr-line>
					<city>Los Mochis</city>
					<state>Sinaloa</state>
					<postal-code>81200</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<aff id="aff4">
				<label>4</label>
				<institution content-type="original">Sección de Estudios de Posgrado e
					Investigación, UPIITA, Instituto Politécnico Nacional Gustavo A. Madero, Cd. de
					México, 07340, México. </institution>
				<institution content-type="normalized">Instituto Politécnico Nacional</institution>
				<institution content-type="orgdiv2">Sección de Estudios de Posgrado e
					Investigación</institution>
				<institution content-type="orgdiv1">UPIITA</institution>
				<institution content-type="orgname">Instituto Politécnico Nacional</institution>
				<addr-line>
					<state>Cd. de México</state>
					<postal-code>07340</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<author-notes>
				<corresp id="c1">
					<label>*</label>
					<email>lresendiz@ipn.mx</email>
				</corresp>
			</author-notes>
			<pub-date date-type="pub" publication-format="electronic">
				<day>22</day>
				<month>05</month>
				<year>2020</year>
			</pub-date>
			<pub-date date-type="collection" publication-format="electronic">
				<month>09</month>
				<year>2017</year>
			</pub-date>
			<volume>30</volume>
			<issue>03</issue>
			<fpage>46</fpage>
			<lpage>50</lpage>
			<history>
				<date date-type="received">
					<day>06</day>
					<month>07</month>
					<year>2017</year>
				</date>
				<date date-type="accepted">
					<day>12</day>
					<month>09</month>
					<year>2017</year>
				</date>
			</history>
			<permissions>
				<license license-type="open-access"
					xlink:href="https://creativecommons.org/licenses/by-nc/4.0/" xml:lang="en">
					<license-p>This is an open-access article distributed under the terms of the
						Creative Commons Attribution License</license-p>
				</license>
			</permissions>
			<abstract>
				<title>Abstract</title>
				<p>We analyze the influence of three combined effects on the contact resistance in
					organic- based thin film transistors: a) the active layer thickness, b) device
					architecture and c) semiconductor degradation. Transfer characteristics and
					parasitic series resistance were analyzed in devices with three different active
					layer thicknesses (50, 100 and 150 nm) using top contact (TC) and bottom contact
					(BC) thin film transistor (TFT) configurations. In both configurations, the
					lowest contact resistance (2.49 x 10<sup>6</sup> Ω) and the highest field-effect
					mobility (4.8 x 10<sup>-2</sup> cm<sup>2</sup>/Vs) was presented in devices with
					the thicker pentacene film. Top contact thin film transistors presented
					field-effect mobility values one order of magnitude higher (4.8 x
						10<sup>-2</sup> cm<sup>2</sup>/Vs) than bottom contact ones (1 x
						10<sup>-3</sup> cm<sup>2</sup>/Vs). Threshold voltage for top-contact thin
					film transistors was -3.1 V. After 2 months, performance in the devices degraded
					and presented an increase of one order of magnitude (10<sup>5</sup> -
						10<sup>6</sup> Ω) for BC-TFTs and two orders of magnitude (10<sup>6</sup> -
						10<sup>8</sup> Ω) for TC-TFTs in contact resistance.</p>
			</abstract>
			<kwd-group xml:lang="en">
				<title>Keywords:</title>
				<kwd>Thin Film Transistors</kwd>
				<kwd>Polymers</kwd>
				<kwd>Contact resistance</kwd>
			</kwd-group>
			<funding-group>
				<award-group award-type="contract">
					<funding-source>SIP-IPN</funding-source>
					<funding-source>CONACYT</funding-source>
					<award-id>20171781</award-id>
					<award-id>CB-2014/240103</award-id>
				</award-group>
			</funding-group>
			<counts>
				<fig-count count="5"/>
				<table-count count="2"/>
				<equation-count count="1"/>
				<ref-count count="35"/>
				<page-count count="05"/>
			</counts>
		</article-meta>
	</front>
	<body>
		<sec sec-type="intro">
			<title>Introduction</title>
			<p>Organic thin film transistors (OTFTs) have attracted interest for large area
				electronic applications due to the compatibility with low cost and low temperature
				fabrication processes. Depending on the device configuration, several parasitic
				effects could limit its performance. Among the most important effects, parasitic
				series resistance has been reported to strongly affect the electrical performance of
				the thin film transistors (TFTs) [<xref ref-type="bibr" rid="B1">1</xref>]. In fact,
				as the resistance of the channel decreases, the contact resistance becomes
				increasingly important, in particular in short channel devices. Series resistance
				can be influenced by metal contact, film thickness, device architecture, substrate
				roughness, device processing, and temperature [<xref ref-type="bibr" rid="B2"
					>2</xref>-<xref ref-type="bibr" rid="B6">6</xref>]. Therefore it is important to
				analyze the two typical contact configurations used for OTFTs: top-contact (TC) and
				bottom-contact (BC). For example, the deposition of the active layer in BC-TFTs is
				the last fabrication step; therefore the semiconductor is not exposed to other
				processes as in TC-TFTs. However, BC-TFTs have showed several drawbacks compared to
				TC-TFTs, as the application of a gate voltage induces a channel with a higher
				conductivity at the semiconductor/dielectric interface [<xref ref-type="bibr"
					rid="B7">7</xref>]. TC-TFTs have exhibited contact resistance (Rc) of about one
				order of magnitude higher than BC-TFTs [<xref ref-type="bibr" rid="B8">8</xref>] and
				Rc dependence on the pentacene/Au thickness ratio [<xref ref-type="bibr" rid="B9"
					>9</xref>].</p>
			<p>Another important effect limiting the OTFT performance is the degradation of the
				active layer when exposed to ambient, as a result of oxygen diffusion in the bulk of
				the material. The oxygen absorption in the active layer degrades the current-voltage
				characteristics [<xref ref-type="bibr" rid="B10">10</xref>]. For pentacene OTFTs,
				researchers have found still functional devices with decreased performance in terms
				of field-effect mobility (<italic>μ</italic>), on-current, <italic>I</italic>
				<sub>
					<italic>on/off</italic>
				</sub> ratio and threshold voltage <italic>(V</italic>
				<sub>
					<italic>T</italic>
				</sub>
				<italic>)</italic> shifting even after degradation [<xref ref-type="bibr" rid="B11"
					>11</xref>-<xref ref-type="bibr" rid="B12">12</xref>].</p>
			<p>Although researchers have analyzed the influence of the pentacene degradation in the
				performance of the OTFTs, they only focus in the main parameters such as
					<italic>μ</italic> and drain current (<italic>I</italic>
				<sub>
					<italic>d</italic>
				</sub> ) [<xref ref-type="bibr" rid="B13">13</xref>-<xref ref-type="bibr" rid="B14"
					>14</xref>]. In this reports, it has been neglected other important parameters
				of equally importance; for example, the parasitic resistance. In general, different
				authors in different reports have described the characteristics of pentacene-based
				OTFTs in terms of active layer thickness [<xref ref-type="bibr" rid="B8"
					>8</xref>,<xref ref-type="bibr" rid="B15">15</xref>,<xref ref-type="bibr"
					rid="B16">16</xref>], devices structure [<xref ref-type="bibr" rid="B1"
					>1</xref>-<xref ref-type="bibr" rid="B2">2</xref>,<xref ref-type="bibr" rid="B7"
					>7</xref>,<xref ref-type="bibr" rid="B16">16</xref>] and degradation [<xref
					ref-type="bibr" rid="B10">10</xref>-<xref ref-type="bibr" rid="B14">14</xref>].
				However, a complete analysis for the same OTFT technology has not been reported.</p>
			<p>In this study, the influences of three combined effects on the Rc: a) active layer
				thickness, b) device architecture and c) semiconductor degradation are investigated
				in pentacene-based OTFTs. This analysis can be applied to other organic
				dielectric/semiconductor systems. We fabricated TC and BC TFT configurations with a
					SiO<sub>2</sub>/parylene dielectric bilayer to minimize the leakage current. The
				stability and lifetime of the TFTs were analyzed.</p>
		</sec>
		<sec>
			<title>Experimental details</title>
			<p>OTFTs were fabricated using a highly doped p-type silicon wafer with a back common
				aluminum layer used as gate electrode. First, 190 nm of parylene-C were deposited by
				chemical vapor deposition on top of 50 nm of thermally grown SiO2 to form a gate
				dielectric bilayer. SiO<sub>2</sub> helps to reduce the gate leakage current,
				whereas parylene-C improves the dielectric/semiconductor interface with pentacene
					[<xref ref-type="bibr" rid="B17">17</xref>,<xref ref-type="bibr" rid="B18"
					>18</xref>]. Next, aluminum gate metal was deposited on the backside of the
				wafer. Then, three pentacene film thicknesses 50 nm, 100 nm and 150 nm were
				sublimated while the substrate was kept at room temperature. In order to define BC
				and TC configuration the 150 nm thickness contacts were deposited, using a shadow
				mask, by e-beam evaporation prior to, or after, the pentacene deposition,
				respectively. BC-TFTs and TC-TFTs are shown in <xref ref-type="fig" rid="f1">Figure
					1a</xref>) and <xref ref-type="fig" rid="f1">1b</xref>), respectively.</p>
			<p>
				<fig id="f1">
					<label>Figure 1</label>
					<caption>
						<title>Cross-section of PTFTs with dielectric SiO2/parylene bilayer. a) TC,
							b) BC.</title>
					</caption>
					<graphic xlink:href="1665-3521-sv-30-03-46-gf1.png"/>
				</fig>
			</p>
			<p>OTFTs were electrically characterized immediately after fabrication using a Keithley
				4200 semiconductor characterization system. OTFTs were also measured one and two
				months after being stored at room temperature in dark ambient conditions.</p>
		</sec>
		<sec sec-type="results|discussion">
			<title>Results and discussion</title>
			<p>
				<xref ref-type="fig" rid="f2">Figure 2</xref> shows the transfer characteristics of
				BC-TFTs and TC-TFTs fabricated with three different pentacene thicknesses. As can be
				seen, <italic>I</italic>
				<sub>
					<italic>D</italic>
				</sub> is higher for BC-TFTs (open symbols) and the devices remained always on,
				which is the result of a less resistive path for the current between source and
				drain compared to TC-TFTs (solid symbols) configuration. In BC-TFTs, the holes are
				injected/collected directly from the sidewall of the electrodes to the channel.
				Therefore, the current flows parallel to the polymer chains and the overall
				resistance the carriers experience in BC-TFTs is lower than in TC-TFTs, where the
				carriers need to flow vertically from the contact through the pentacene bulk in
				order to reach the channel, resulting in an additional resistance component that
				limits the electrical current.</p>
			<p>
				<fig id="f2">
					<label>Figure 2</label>
					<caption>
						<title>BC vs. TC Pentacene TFTs transfer characteristic.</title>
					</caption>
					<graphic xlink:href="1665-3521-sv-30-03-46-gf2.png"/>
				</fig>
			</p>
			<p><italic>V</italic>
				<sub>
					<italic>t</italic>
				</sub> and <italic>μ</italic> for TFTs were calculated from the extrapolation and
				slope of the <italic>√I</italic>
				<sub>
					<italic>D</italic>
				</sub> vs. <italic>V</italic>
				<sub>
					<italic>g</italic>
				</sub> curve measured in saturation respectively, following the expression for
					<italic>I</italic>
				<sub>
					<italic>D</italic>
				</sub> in MOS transistors:</p>
			<p>
				<disp-formula id="e1">
					<mml:math>
						<mml:msub>
							<mml:mrow>
								<mml:mi>I</mml:mi>
							</mml:mrow>
							<mml:mrow>
								<mml:mi>D</mml:mi>
							</mml:mrow>
						</mml:msub>
						<mml:mo>=</mml:mo>
						<mml:msub>
							<mml:mrow>
								<mml:mi>C</mml:mi>
							</mml:mrow>
							<mml:mrow>
								<mml:mi>o</mml:mi>
								<mml:mi>x</mml:mi>
							</mml:mrow>
						</mml:msub>
						<mml:mo>٠</mml:mo>
						<mml:mi>μ</mml:mi>
						<mml:mo>٠</mml:mo>
						<mml:mfrac>
							<mml:mrow>
								<mml:mi>W</mml:mi>
							</mml:mrow>
							<mml:mrow>
								<mml:mi>L</mml:mi>
							</mml:mrow>
						</mml:mfrac>
						<mml:mo>٠</mml:mo>
						<mml:mfrac>
							<mml:mrow>
								<mml:msup>
									<mml:mrow>
										<mml:mo>(</mml:mo>
										<mml:msub>
											<mml:mrow>
												<mml:mi>V</mml:mi>
											</mml:mrow>
											<mml:mrow>
												<mml:mi>G</mml:mi>
											</mml:mrow>
										</mml:msub>
										<mml:mo>-</mml:mo>
										<mml:msub>
											<mml:mrow>
												<mml:mi>V</mml:mi>
											</mml:mrow>
											<mml:mrow>
												<mml:mi>T</mml:mi>
											</mml:mrow>
										</mml:msub>
										<mml:mo>)</mml:mo>
									</mml:mrow>
									<mml:mrow>
										<mml:mn>2</mml:mn>
									</mml:mrow>
								</mml:msup>
							</mml:mrow>
							<mml:mrow>
								<mml:mn>2</mml:mn>
							</mml:mrow>
						</mml:mfrac>
					</mml:math>
					<label>(1)</label>
				</disp-formula>
			</p>
			<p>where <italic>C</italic>
				<sub>
					<italic>ox</italic>
				</sub> is the dielectric capacitance per unit area; <italic>W</italic> is the
				channel width and L is the channel length.</p>
			<p>Calculated <italic>V</italic>
				<sub>
					<italic>T</italic>
				</sub> for BC-TFTs is more positive compared to TC-TFTs, due to the higher channel
				and bulk conductivity resulting from the higher carrier injection and the direct
				contact between the accumulation layer and the source-drain (S-D) contacts that does
				not allow to completely close the channel [<xref ref-type="bibr" rid="B19"
				>19</xref>]. Carrier injection from S-D electrodes in BC-TFTs is expected to be
				higher; however, with a smaller effective contact area compared to TC-TFTs. This VT
				increment in BC-TFTs is due to overestimations for short channel devices using the
				square-root-of-current-extrapolation (SRE) method [<xref ref-type="bibr" rid="B20"
					>20</xref>], which is greatly affected by series resistances [<xref
					ref-type="bibr" rid="B21">21</xref>].</p>
			<p>TC-TFTs presented mobilities one order of magnitude higher (4.8 × 10<sup>-2</sup>
					cm<sup>2</sup>/Vs) than BC-TFTs (1 × 10<sup>-3</sup> cm<sup>2</sup>/Vs). Changes
				in mobility on BC-TFTs have been attributed to contact (semiconductor/metal) effects
				due to a dipole barrier that can shift the vacuum level upward by more than 1 eV,
				avoiding carriers to reach the HOMO level [<xref ref-type="bibr" rid="B22"
					>22</xref>-<xref ref-type="bibr" rid="B24">24</xref>]. However, mobility is not
				dependent on the contacts used in the TFT and is normally dictated by the
				dielectric/semiconductor interface in both TC and BC structures. Therefore, the
				differences in the calculated values for mobilities between the two structures could
				be misleading and the result of the use of a TFT model that does not include a term
				related to the contact effects and bulk current. Also, we observed for all the
				pentacene thicknesses a channel length dependence in BC-TFTs, as μ increased almost
				an order of magnitude for larger channel lengths, whereas for TC-TFTs μ remained
				almost constant for all the channel lengths. Since the contact effects are not
				considered in the model, it can be assumed that more accurate values are obtained
				for larger channels (80 μm) where the contact resistance effects are less important
					(<xref ref-type="table" rid="t1">Table 1</xref>).</p>
			<p>
				<table-wrap id="t1">
					<label>Table 1</label>
					<caption>
						<title>Behavior of μ for devices with L = 80 μm.</title>
					</caption>
					<table style="border-collapse: collapse">
						<colgroup>
							<col/>
							<col span="2"/>
						</colgroup>
						<thead>
							<tr>
								<th align="center" style="border-top: 1px solid;">Thickness</th>
								<th align="center" colspan="2"
									style="border-top: 1px solid; border-bottom: 1px solid"
										><italic>μ</italic> (cm<sup>2</sup>/V-s) </th>
							</tr>
						
							<tr>
								<th align="center" style="border-bottom: 1px solid">(nm)</th>
								<th align="center"
									style="border-top: none; border-bottom: 1px solid">TC</th>
								<th align="center"
									style="border-top: none; border-bottom: 1px solid">BC</th>
							</tr>
							</thead>
							<tbody>
							<tr>
								<td align="center" style="border-bottom: none">50</td>
								<td align="center" style="border-bottom: none">8.7 ×
									10<sup>-3</sup></td>
								<td align="center" style="border-bottom: none">4.41 ×
										10<sup>-3</sup></td>
							</tr>
							
							<tr>
								<td align="center" style="border-bottom: none">100</td>
								<td align="center" style="border-bottom: none">1.4 ×
									10<sup>-2</sup></td>
								<td align="center" style="border-bottom: none">5.41 ×
										10<sup>-3</sup></td>
							</tr>
							<tr>
								<td align="center" style="border-bottom: 1px solid">150</td>
								<td align="center" style="border-bottom: 1px solid"> 4.8 ×
										10<sup>-2</sup></td>
								<td align="center" style="border-bottom: 1px solid">8.59 ×
										10<sup>-3</sup></td>
							</tr>
						</tbody>
					</table>
				</table-wrap>
			</p>
			<sec>
				<title><italic>Contact Resistance</italic></title>
				<p><italic>Rc</italic> was obtained from experimental data at <italic>V</italic>
					<sub>
						<italic>d</italic>
					</sub> = 3.5- V in the linear regime using the transmission line method
						<italic>(R</italic> vs. L) [<xref ref-type="bibr" rid="B25">25</xref>].
					TC-TFTs presented a higher contact resistance (10<sup>7</sup> Ω) than BC-TFTs
						(10<sup>5</sup> Ω). <italic>Rc</italic> seems to be reduced as
						<italic>VG</italic> is increased for TC-TFTs, whereas for BC-TFTs,
						<italic>Rc</italic> remained in the same order of magnitude for all the
					pentacene thicknesses, see <xref ref-type="fig" rid="f3">Figure 3</xref>. Higher
					contact resistance in TC-TFTs could be due to an additional resistance presented
					in the structure from the vertical transport through the bulk of pentacene that
					limits carrier injection from the semiconductor/contact interface to the
					channel.</p>
				<p>
					<fig id="f3">
						<label>Figure 3</label>
						<caption>
							<title>Contact resistance in top and bottom contact devices.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-30-03-46-gf3.png"/>
					</fig>
				</p>
				<p>When <italic>V</italic>
					<sub>
						<italic>g</italic>
					</sub> becomes higher, the barrier the carriers see is reduced and the
					conduction is no longer limited by the bulk, reducing <italic>Rc</italic>. In
					BC-TFTs this barrier is very small and there is no <italic>V</italic>
					<sub>
						<italic>g</italic>
					</sub> dependence [<xref ref-type="bibr" rid="B25">25</xref>]. Nevertheless,
					both configurations presented the same trend of contact resistance in terms of
					semiconductor thickness, where the thinnest TFTs presented the highest contact
					resistance. This effect can be related to thickness ratio between the S-D
					contacts and the semiconductor. Thinner semiconductor films do not cover
					entirely the height of the contacts in case of the BC-TFTs, therefore the
					contacted area is smaller compared to thicker semiconductor films. In case of
					the TC-TFTs, the increase of the contact resistance with decrease in film
					thickness may be due roughness and grain size of the polycrystalline
					semiconductor. Results reported in [<xref ref-type="bibr" rid="B26">26</xref>]
					indicate that grain size increases with increasing thickness of polycrystalline
					films. In [<xref ref-type="bibr" rid="B27">27</xref>,<xref ref-type="bibr"
						rid="B28">28</xref>] was shown an increase in the mobility with increasing
					grain size and decreasing surface roughness. And, a decrease of the contact
					resistance was observed in [<xref ref-type="bibr" rid="B29">29</xref>] due to an
					increase in field-effect mobility of pentacene TFTs.</p>
			</sec>
			<sec>
				<title><italic>Degradation</italic></title>
				<p>
					<xref ref-type="fig" rid="f4">Figure 4</xref> shows the transfer curves for
					TC-TFTs with 150 nm pentacene films (devices with higher mobility) after one and
					two months of being fabricated. Degradation produced a decrease in
						<italic>μ</italic> and a shift in the <italic>V</italic>
					<sub>
						<italic>T</italic>
					</sub> . Mobility decreased almost an order of magnitude per month in both
					configurations. <italic>V</italic>
					<sub>
						<italic>t</italic>
					</sub> on TC-TFTs tends to increase and the maximum on-current is reduced by an
					order of magnitude per month, as shown in <xref ref-type="table" rid="t2">Table
						2</xref>, nevertheless <italic>I</italic>
					<sub>
						<italic>on/off</italic>
					</sub> ratio remains in the same order of magnitude after 2 months. Similar
					results have been reported in [<xref ref-type="bibr" rid="B30">30</xref>,<xref
						ref-type="bibr" rid="B31">31</xref>], where a drop in field-effect mobility,
					threshold voltage and drain current was obtained as a result of active layer
					degradation after 1320 h the pentacene TFTs were fabricated.</p>
				<p>
					<fig id="f4">
						<label>Figure 4</label>
						<caption>
							<title>Transfer curves in saturation after 0, 1 and 2 months.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-30-03-46-gf4.png"/>
					</fig>
				</p>
				<p>
					<table-wrap id="t2">
						<label>Table 2</label>
						<caption>
							<title>Behavior of <italic>μ</italic>, <italic>I</italic>
								<sub>
									<italic>D</italic>
								</sub>
								<italic>, Ion/off</italic> ratio and <italic>V</italic>
								<sub>
									<italic>T</italic>
								</sub> considering two months analysis.</title>
						</caption>
						<table style="border-collapse: collapse">
							<colgroup>
								<col/>
								<col span="2"/>
								<col/>
								<col/>
								<col span="2"/>
								<col span="2"/>
							</colgroup>
							<thead>
								<tr>
									<th align="left" rowspan="2"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>Month</th>
									<th align="left" colspan="2"
										style="border-top: 1px solid; border-bottom: 1px solid">μ
										(cm<sup>2</sup>/V-s) </th>
									<th align="left" colspan="2"
										style="border-top: 1px solid; border-bottom: 1px solid"
										><italic>Vt</italic> (V)</th>
									<th align="left" colspan="2"
										style="border-top: 1px solid; border-bottom: 1px solid"
										><italic>i</italic>
										<sub>
											<italic>Dmax</italic>
										</sub> (A) </th>
									<th align="left" colspan="2"
										style="border-top: 1px solid; border-bottom: 1px solid"
										><italic>I</italic>
										<sub>
											<italic>on/off</italic>
										</sub>
										<italic>ratio</italic> (A) </th>
								</tr>
								<tr>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>TC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>BC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>TC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>BC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>TC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>BC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>TC</th>
									<th align="left"
										style="border-top: 1px solid; border-bottom: 1px solid"
										>BC</th>
								</tr>
							</thead>
							<tbody>
								<tr>
									<td align="left" style="border-bottom: none">0</td>
									<td align="left" style="border-bottom: none">3 ×
										10<sup>-2</sup></td>
									<td align="left" style="border-bottom: none">1.7
										×10<sup>-2</sup></td>
									<td align="left" style="border-bottom: none">3.1-</td>
									<td align="left" style="border-bottom: none">64.56</td>
									<td align="left" style="border-bottom: none">1.01 ×
										10<sup>-6</sup></td>
									<td align="left" style="border-bottom: none">2.26 ×
										10<sup>-6</sup></td>
									<td align="left" style="border-bottom: none">9.83 ×
										10<sup>1</sup></td>
									<td align="left" style="border-bottom: none">12.7 ×
										10<sup>-1</sup></td>
								</tr>
								<tr>
									<td align="left" style="border-bottom: none">1</td>
									<td align="left" style="border-bottom: none">8 ×
										10<sup>-3</sup></td>
									<td align="left" style="border-bottom: none">3 ×
										10<sup>-3</sup></td>
									<td align="left" style="border-bottom: none">3.3-</td>
									<td align="left" style="border-bottom: none">27.04</td>
									<td align="left" style="border-bottom: none">2.04 ×
										19<sup>-7</sup></td>
									<td align="left" style="border-bottom: none">7.8 ×
										10<sup>-7</sup></td>
									<td align="left" style="border-bottom: none">8.23 ×
										10<sup>1</sup></td>
									<td align="left" style="border-bottom: none">17.9 ×
										10<sup>-1</sup></td>
								</tr>
								<tr>
									<td align="left" style="border-bottom: 1px solid">2</td>
									<td align="left" style="border-bottom: 1px solid">2 ×
										10<sup>-3</sup></td>
									<td align="left" style="border-bottom: 1px solid">4 ×
										10<sup>-4</sup></td>
									<td align="left" style="border-bottom: 1px solid">4.96-</td>
									<td align="left" style="border-bottom: 1px solid">16.87</td>
									<td align="left" style="border-bottom: 1px solid">4.79 ×
										10<sup>-8</sup></td>
									<td align="left" style="border-bottom: 1px solid">1.1 ×
										10<sup>-6</sup></td>
									<td align="left" style="border-bottom: 1px solid">6.29 ×
										10<sup>1</sup></td>
									<td align="left" style="border-bottom: 1px solid">15.9 ×
										10<sup>-1</sup></td>
								</tr>
							</tbody>
						</table>
					</table-wrap>
				</p>
				<p>
					<xref ref-type="fig" rid="f5">Figure 5</xref> shows contact resistance for both
					configurations. In both cases, contact resistance becomes higher after two
					months, which indicates also degradation at the semiconductor/metal interface
					that follows the same trend in terms of <italic>V</italic>
					<sub>
						<italic>g</italic>
					</sub> for each TFT configuration.</p>
				<p>
					<fig id="f5">
						<label>Figure 5</label>
						<caption>
							<title>Contact resistance in a) TC and b) BC, after 0 and 2 months with
								different thicknesses.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-30-03-46-gf5.png"/>
					</fig>
				</p>
				<p>This behavior might be due to OH and C-H<sub>2</sub> defects in pentacene after
					the material has been exposed to oxygen and humid environments. These defects
					modify the structure of the pentacene molecule and produce localized states in
					the bandgap as well as hole trapping at the grain boundaries, where
						C-H<sub>2</sub> defects form a C<sub>22</sub>H<sub>15</sub> molecule and one
					of the C atoms becomes fourfold coordinated. On the other hand, OH forms a
						C<sub>22</sub>H<sub>13</sub>O molecule in which there is a C-O double bond
					by replacing one of the hydrogen atoms by an oxygen atom [<xref ref-type="bibr"
						rid="B32">32</xref>].</p>
				
				<p>Considering also that the morphology of polycrystalline pentacene films is
					relatively open, with large crevices between the grains that run almost all the
					way down to the first few monolayers on the substrate [<xref ref-type="bibr"
						rid="B33">33</xref>] and that pentacene is highly hydrophobic,
					H<sub>2</sub>O molecules can easily diffuse into crevices modifying the
					morphology of the film, inducing a phase transition from a thin film phase to a
					bulk- like phase [<xref ref-type="bibr" rid="B34">34</xref>]. Also, interacting
					with the trapped carriers at the grain boundaries by limiting the charge
					transport and therefore, affecting the performance of the devices [<xref
						ref-type="bibr" rid="B35">35</xref>].</p>
				<p><italic>Rc</italic> increases with time and conductivity through the channel is
					reduced by the limited carrier transport. Oxygen located in the bulk of the film
					can continue absorbing oxygen from ambient, as it has been found this for the
					same semiconductor/contact thickness and for thinner pentacene films. In the
					thickest TC-TFTs, Rc increases more over time because it is more likely to have
					more defects and traps with increasing grain size. In the case of the BC-TFTs
					with 100 nm pentacene films Rc increases more rapidly maybe due to humidity does
					not reach the dielectric/semiconductor interface and pentacene films continue
					absorbing oxygen from the ambient, also defects may be lower, not affecting as
					much as the TC-TFTs performance.</p>
			</sec>
		</sec>
		<sec sec-type="conclusions">
			<title>Conclusions</title>
			<p>In summary, an analysis due to the effects of the active layer thickness, device
				architecture and pentacene degradation on the Rc of the OTFTs was presented. Devices
				presented thickness dependence; this may be due roughness and grain size of the
				active layer. Devices with thicker active layer presented a better performance,
				TC-TFTs presented higher mobility as high as 4.8 × 10<sup>-2</sup> cm<sup>2</sup>/Vs
				compared to BC-TFTs (4.41 × 10<sup>-3</sup> cm<sup>2</sup>/Vs). Also, the results
				were less sensitive to geometry of the device (channel length). In terms of
				configuration, TC-TFTs show a more resistive channel (10<sup>7</sup> Ω) and a
					<italic>V</italic>
				<sub>
					<italic>g</italic>
				</sub> dependence compared to BC-TFTs for almost an order of magnitude
					(10<sup>5</sup> Ω). This effect might be due to BC-TFTs have a smaller
				Au-contact area and therefore a smaller carrier injection at the
				contact/semiconductor interface. We have to consider that BC-TFTs have a
				metal-insulator-metal structure, where S-D contacts are directly in contact to the
				channel and dielectric layer is exposed to contact deposition process, whereas TC-
				TFTs have a metal-insulator-semiconductor structure where the active layer is
				exposed to the contact deposition process. Despite oxygen and moisture from the
				environment contributes to the active layer degradation, which affects to the
				performance of the device, OTFTs still be functional after 2 months, nevertheless
				with a decrease of an order of magnitude in terms of <italic>μ</italic>
					(10<sup>-2</sup> - 10<sup>-3</sup> cm<sup>2</sup>/Vs) and <italic>I</italic>
				<sub>
					<italic>Dmax</italic>
				</sub> (1 × 10<sup>-6</sup> - 4.79 × 10<sup>-8</sup> A), while Rc increase two
				orders of magnitude (2.49 × 10<sup>6</sup> - 1.1 × 10<sup>8</sup> Ω) for TC-TFTs and
				an order of magnitude (1.76 × 10<sup>5</sup> - 1.57 × 10<sup>6</sup> Ω) for BC-TFTs,
				due to hole trapping and oxygen absorption in the active layer.</p>
		</sec>
	</body>
	<back>
		<ack>
			<title>Acknowledgements</title>
			<p>This work was supported by SIP-IPN project 20171781 and partially funded by CONACYT
				project CB-2014/240103.</p>
		</ack>
		<ref-list>
			<title>References</title>
			<ref id="B1">
				<label>[1]</label>
				<mixed-citation> [1] . D. Gupta, M. Katiyar, D. Gupta, <italic>Org.
						Electron.</italic>
					<bold>10</bold>, 775 (2009). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Gupta</surname>
							<given-names>D.</given-names>
						</name>
						<name>
							<surname>Katiyar</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Gupta</surname>
							<given-names>D.</given-names>
						</name>
					</person-group>
					<source>Org. Electron.</source>
					<volume>10</volume>
					<fpage>775</fpage>
					<lpage>775</lpage>
					<year>2009</year>
				</element-citation>
			</ref>
			<ref id="B2">
				<label>[2]</label>
				<mixed-citation> [2]. D.J. Gundlach, L. Zhou, J.A. Nichols, T.N. Jackson, P.V.
					Necliudov, M.S. Shur, <italic>J. Appi Phys.</italic>
					<bold>100</bold>, 024509 (2006).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Gundlach</surname>
							<given-names>D.J.</given-names>
						</name>
						<name>
							<surname>Zhou</surname>
							<given-names>L.</given-names>
						</name>
						<name>
							<surname>Nichols</surname>
							<given-names>J.A.</given-names>
						</name>
						<name>
							<surname>Jackson</surname>
							<given-names>T.N.</given-names>
						</name>
						<name>
							<surname>Necliudov</surname>
							<given-names>P.V.</given-names>
						</name>
						<name>
							<surname>Shur</surname>
							<given-names>M.S.</given-names>
						</name>
					</person-group>
					<source>J. Appi Phys.</source>
					<volume>100</volume>
					<fpage>024509</fpage>
					<lpage>024509</lpage>
					<year>2006</year>
				</element-citation>
			</ref>
			<ref id="B3">
				<label>[3]</label>
				<mixed-citation> [3]. S. Lee, S.J. Kang, G. Jo, M. Choe, W. Park, J. Yoon, T. Kwon,
					Y.H. Kahng, D.Y. Kim, B.H. Lee, T. Lee, <italic>Appi. Phys. Lett.</italic>
					<bold>99</bold>, 083306 (2011).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Lee</surname>
							<given-names>S.</given-names>
						</name>
						<name>
							<surname>Kang</surname>
							<given-names>S.J.</given-names>
						</name>
						<name>
							<surname>Jo</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Choe</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Park</surname>
							<given-names>W.</given-names>
						</name>
						<name>
							<surname>Yoon</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Kwon</surname>
							<given-names>T.</given-names>
						</name>
						<name>
							<surname>Kahng</surname>
							<given-names>Y.H.</given-names>
						</name>
						<name>
							<surname>Kim</surname>
							<given-names>D.Y.</given-names>
						</name>
						<name>
							<surname>Lee</surname>
							<given-names>B.H.</given-names>
						</name>
						<name>
							<surname>Lee</surname>
							<given-names>T.</given-names>
						</name>
					</person-group>
					<source>Appi. Phys. Lett.</source>
					<volume>99</volume>
					<fpage>083306</fpage>
					<lpage>083306</lpage>
					<year>2011</year>
				</element-citation>
			</ref>
			<ref id="B4">
				<label>[4]</label>
				<mixed-citation> [4]. H. Klauk, G. Schmid, W. Radlik, W. Weber, L. Zhou, C.D.
					Sheraw, J.A. Nichols, T.N. Jackson, <italic>Solid-State Electron.</italic>
					<bold>47</bold>, 297 (2003).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Klauk</surname>
							<given-names>H.</given-names>
						</name>
						<name>
							<surname>Schmid</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Radlik</surname>
							<given-names>W.</given-names>
						</name>
						<name>
							<surname>Weber</surname>
							<given-names>W.</given-names>
						</name>
						<name>
							<surname>Zhou</surname>
							<given-names>L.</given-names>
						</name>
						<name>
							<surname>Sheraw</surname>
							<given-names>C.D.</given-names>
						</name>
						<name>
							<surname>Nichols</surname>
							<given-names>J.A.</given-names>
						</name>
						<name>
							<surname>Jackson</surname>
							<given-names>T.N.</given-names>
						</name>
					</person-group>
					<source>Solid-State Electron.</source>
					<volume>47</volume>
					<fpage>297</fpage>
					<lpage>297</lpage>
					<year>2003</year>
				</element-citation>
			</ref>
			<ref id="B5">
				<label>[5]</label>
				<mixed-citation> [5]. J. Park, J.M. Kang, D.W. Kim, J.S. Choi, <italic>Thin Solid
						Films</italic>
					<bold>518</bold>, 6232 (2010).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Park</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Kang</surname>
							<given-names>J.M.</given-names>
						</name>
						<name>
							<surname>Kim</surname>
							<given-names>D.W.</given-names>
						</name>
						<name>
							<surname>Choi</surname>
							<given-names>J.S.</given-names>
						</name>
					</person-group>
					<source>Thin Solid Films</source>
					<volume>518</volume>
					<fpage>6232</fpage>
					<lpage>6232</lpage>
					<year>2010</year>
				</element-citation>
			</ref>
			<ref id="B6">
				<label>[6]</label>
				<mixed-citation> [6]. Y.J. Lin and B.C. Huang, <italic>Microelectron. Eng.</italic>
					<bold>103</bold>, 76 (2013). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Lin</surname>
							<given-names>Y.J.</given-names>
						</name>
						<name>
							<surname>Huang</surname>
							<given-names>B.C.</given-names>
						</name>
					</person-group>
					<source>Microelectron. Eng.</source>
					<volume>103</volume>
					<fpage>76</fpage>
					<lpage>76</lpage>
					<year>2013</year>
				</element-citation>
			</ref>
			<ref id="B7">
				<label>[7]</label>
				<mixed-citation> [7]. F. Li, A. Nathan, Y. Wu and B. S. Ong, <italic>Organic Thin
						Film Transistor Integration: A Hybrid Approach</italic>
						(<italic>Wiley</italic>, <italic>Weinheim Germany</italic>,
						<italic>2011</italic>
					<italic>).</italic></mixed-citation>
				<element-citation publication-type="book">
					<person-group person-group-type="author">
						<name>
							<surname>Li</surname>
							<given-names>F.</given-names>
						</name>
						<name>
							<surname>Nathan</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Wu</surname>
							<given-names>Y.</given-names>
						</name>
						<name>
							<surname>Ong</surname>
							<given-names>B. S.</given-names>
						</name>
					</person-group>
					<source>Organic Thin Film Transistor Integration: A Hybrid Approach</source>
					<publisher-name>Wiley</publisher-name>
					<publisher-loc>Weinheim Germany</publisher-loc>
					<year>2011</year>
				</element-citation>
			</ref>
			<ref id="B8">
				<label>[8]</label>
				<mixed-citation> [8]. G.B. Blanchet, C.R. Fincher, M. Lefenfeld, <italic>Appl. Phys.
						Lett</italic>
					<bold>84</bold>, 296 (2004).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Blanchet</surname>
							<given-names>G.B.</given-names>
						</name>
						<name>
							<surname>Fincher</surname>
							<given-names>C.R.</given-names>
						</name>
						<name>
							<surname>Lefenfeld</surname>
							<given-names>M.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett</source>
					<volume>84</volume>
					<fpage>296</fpage>
					<lpage>296</lpage>
					<year>2004</year>
				</element-citation>
			</ref>
			<ref id="B9">
				<label>[9]</label>
				<mixed-citation> [9]. S. Gowrisanker, Y. Ai, M.A. Quevedo-Lopez, H. Jia, H.N.
					Alshareef, E. Vogel, B. Gnade, <italic>Appi Phys. Lett.</italic>
					<bold>92</bold>, 153305 (2008). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Gowrisanker</surname>
							<given-names>S.</given-names>
						</name>
						<name>
							<surname>Ai</surname>
							<given-names>Y.</given-names>
						</name>
						<name>
							<surname>Quevedo-Lopez</surname>
							<given-names>M.A.</given-names>
						</name>
						<name>
							<surname>Jia</surname>
							<given-names>H.</given-names>
						</name>
						<name>
							<surname>Alshareef</surname>
							<given-names>H.N.</given-names>
						</name>
						<name>
							<surname>Vogel</surname>
							<given-names>E.</given-names>
						</name>
						<name>
							<surname>Gnade</surname>
							<given-names>B.</given-names>
						</name>
					</person-group>
					<source>Appi Phys. Lett.</source>
					<volume>92</volume>
					<fpage>153305</fpage>
					<lpage>153305</lpage>
					<year>2008</year>
				</element-citation>
			</ref>
			<ref id="B10">
				<label>[10]</label>
				<mixed-citation> [10]. V.H. Martinez-Landeros, G. Gutierrez-Heredia, F.S.
					Aguirre-Tostado, M. Sotelo-Lerma, B.E. Gnade, M.A. Quevedo-Lopez, <italic>Thin
						Solid Films</italic>
					<bold>531</bold>, 398 (2013).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Martinez-Landeros</surname>
							<given-names>V.H.</given-names>
						</name>
						<name>
							<surname>Gutierrez-Heredia</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Aguirre-Tostado</surname>
							<given-names>F.S.</given-names>
						</name>
						<name>
							<surname>Sotelo-Lerma</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Gnade</surname>
							<given-names>B.E.</given-names>
						</name>
						<name>
							<surname>Quevedo-Lopez</surname>
							<given-names>M.A.</given-names>
						</name>
					</person-group>
					<source>Thin Solid Films</source>
					<volume>531</volume>
					<fpage>398</fpage>
					<lpage>398</lpage>
					<year>2013</year>
				</element-citation>
			</ref>
			<ref id="B11">
				<label>[11]</label>
				<mixed-citation> [11] . Ch. Pannemann, T. Diekmann, U. Hilleringmann, <italic>J.
						Mat. Res.</italic>
					<bold>19</bold>, 1999 (2004).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Pannemann</surname>
							<given-names>Ch.</given-names>
						</name>
						<name>
							<surname>Diekmann</surname>
							<given-names>T.</given-names>
						</name>
						<name>
							<surname>Hilleringmann</surname>
							<given-names>U.</given-names>
						</name>
					</person-group>
					<source>J. Mat. Res.</source>
					<volume>19</volume>
					<fpage>1999</fpage>
					<lpage>1999</lpage>
					<year>2004</year>
				</element-citation>
			</ref>
			<ref id="B12">
				<label>[12]</label>
				<mixed-citation> [12]. D. Simeone, M. Rapisarda, G. Fortunato, A. Valletta, L.
					Mariucci, <italic>Org. Electron.</italic>
					<bold>12</bold>, 447 (2011).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Simeone</surname>
							<given-names>D.</given-names>
						</name>
						<name>
							<surname>Rapisarda</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Fortunato</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Valletta</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Mariucci</surname>
							<given-names>L.</given-names>
						</name>
					</person-group>
					<source>Org. Electron.</source>
					<volume>12</volume>
					<fpage>447</fpage>
					<lpage>447</lpage>
					<year>2011</year>
				</element-citation>
			</ref>
			<ref id="B13">
				<label>[13]</label>
				<mixed-citation> [13]. C.R. Kagan, A. Afzali, T. O. Graham, <italic>Appl. Phys.
						Lett.</italic>
					<bold>86</bold>, 193505 (2005).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Kagan</surname>
							<given-names>C.R.</given-names>
						</name>
						<name>
							<surname>Afzali</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Graham</surname>
							<given-names>T. O.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>86</volume>
					<fpage>193505</fpage>
					<lpage>193505</lpage>
					<year>2005</year>
				</element-citation>
			</ref>
			<ref id="B14">
				<label>[14]</label>
				<mixed-citation> [14]. Y. Hu, G. Dong, Y. Liang, L. Wang, Y. Qiu, <italic>Jpn. J.
						Appl. Phys.</italic>
					<bold>44</bold>, L938 (2005).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Hu</surname>
							<given-names>Y.</given-names>
						</name>
						<name>
							<surname>Dong</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Liang</surname>
							<given-names>Y.</given-names>
						</name>
						<name>
							<surname>Wang</surname>
							<given-names>L.</given-names>
						</name>
						<name>
							<surname>Qiu</surname>
							<given-names>Y.</given-names>
						</name>
					</person-group>
					<source>Jpn. J. Appl. Phys.</source>
					<volume>44</volume>
					<fpage>L938</fpage>
					<lpage>L938</lpage>
					<year>2005</year>
				</element-citation>
			</ref>
			<ref id="B15">
				<label>[15]</label>
				<mixed-citation> [15]. L. Mariucci, D. Simeone, S. Cipolloni, L. Maiolo, A. Pecora,
					G. Fortunato, S. Brotherton, <italic>Solid-State Electron.</italic>
					<bold>52</bold>, 412 (2008). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Mariucci</surname>
							<given-names>L.</given-names>
						</name>
						<name>
							<surname>Simeone</surname>
							<given-names>D.</given-names>
						</name>
						<name>
							<surname>Cipolloni</surname>
							<given-names>S.</given-names>
						</name>
						<name>
							<surname>Maiolo</surname>
							<given-names>L.</given-names>
						</name>
						<name>
							<surname>Pecora</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Fortunato</surname>
							<given-names>G.</given-names>
						</name>
						<name>
							<surname>Brotherton</surname>
							<given-names>S.</given-names>
						</name>
					</person-group>
					<source>Solid-State Electron.</source>
					<volume>52</volume>
					<fpage>412</fpage>
					<lpage>412</lpage>
					<year>2008</year>
				</element-citation>
			</ref>
			<ref id="B16">
				<label>[16]</label>
				<mixed-citation> [16]. B. Kumar, B.K. Kumar, Y.S. Negi, <italic>IETCircuits Devices
						Syst.</italic>, <bold>8</bold>, 131 (2014).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Kumar</surname>
							<given-names>B.</given-names>
						</name>
						<name>
							<surname>Kumar</surname>
							<given-names>B.K.</given-names>
						</name>
						<name>
							<surname>Negi</surname>
							<given-names>Y.S.</given-names>
						</name>
					</person-group>
					<source>IETCircuits Devices Syst.</source>
					<volume>8</volume>
					<fpage>131</fpage>
					<lpage>131</lpage>
					<year>2014</year>
				</element-citation>
			</ref>
			<ref id="B17">
				<label>[17]</label>
				<mixed-citation> [17]. K.N.N. Unni, S. Dabo-Seignon, J.M. Nunzi, <italic>J. Mater.
						Sci.</italic>
					<bold>41</bold>, 1865 (2006).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Unni</surname>
							<given-names>K.N.N.</given-names>
						</name>
						<name>
							<surname>Dabo-Seignon</surname>
							<given-names>S.</given-names>
						</name>
						<name>
							<surname>Nunzi</surname>
							<given-names>J.M.</given-names>
						</name>
					</person-group>
					<source>J. Mater. Sci.</source>
					<volume>41</volume>
					<fpage>1865</fpage>
					<lpage>1865</lpage>
					<year>2006</year>
				</element-citation>
			</ref>
			<ref id="B18">
				<label>[18]</label>
				<mixed-citation> [18]. K. Tsukagoshi, I.Yagi, K. Shigeto, K. Yanagisawa, J. Tanabe,
					Y. Aoyagi, <italic>Appl. Phys. Lett.</italic>
					<bold>87</bold>, 183502 (2005). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Tsukagoshi</surname>
							<given-names>K.</given-names>
						</name>
						<name>
							<surname>Yagi</surname>
							<given-names>I.</given-names>
						</name>
						<name>
							<surname>Shigeto</surname>
							<given-names>K.</given-names>
						</name>
						<name>
							<surname>Yanagisawa</surname>
							<given-names>K.</given-names>
						</name>
						<name>
							<surname>Tanabe</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Aoyagi</surname>
							<given-names>Y.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>87</volume>
					<fpage>183502</fpage>
					<lpage>183502</lpage>
					<year>2005</year>
				</element-citation>
			</ref>
			<ref id="B19">
				<label>[19]</label>
				<mixed-citation> [19]. Y.W. Wang, D.Z. Liu, M.Y. Hong, H.L. Cheng, <italic>Proc. of
						SPIE</italic>
					<bold>7417</bold>, 74171F (2009).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Wang</surname>
							<given-names>Y.W.</given-names>
						</name>
						<name>
							<surname>Liu</surname>
							<given-names>D.Z.</given-names>
						</name>
						<name>
							<surname>Hong</surname>
							<given-names>M.Y.</given-names>
						</name>
						<name>
							<surname>Cheng</surname>
							<given-names>H.L.</given-names>
						</name>
					</person-group>
					<source>Proc. of SPIE</source>
					<volume>7417</volume>
					<fpage>74171F</fpage>
					<lpage>74171F</lpage>
					<year>2009</year>
				</element-citation>
			</ref>
			<ref id="B20">
				<label>[20]</label>
				<mixed-citation> [20]. M. Tsuno, M. Suga, M. Tanaka, K. Shibahara, M.
					Miura-Mattausch, M. Hirose, <italic>IEEE Trans. Electron. Devices</italic>
					<bold>46</bold>, 1429 (1999).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Tsuno</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Suga</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Tanaka</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Shibahara</surname>
							<given-names>K.</given-names>
						</name>
						<name>
							<surname>Miura-Mattausch</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Hirose</surname>
							<given-names>M.</given-names>
						</name>
					</person-group>
					<source>IEEE Trans. Electron. Devices</source>
					<volume>46</volume>
					<fpage>1429</fpage>
					<lpage>1429</lpage>
					<year>1999</year>
				</element-citation>
			</ref>
			<ref id="B21">
				<label>[21]</label>
				<mixed-citation> [21]. D. Boudinet, G.L. Blevennec, C. Serbutoviez, J.M. Verilhac,
					H. Yan, G. Horowitz, <italic>J. Appl. Phys.</italic>
					<bold>105</bold>, 084510 (2009). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Boudinet</surname>
							<given-names>D.</given-names>
						</name>
						<name>
							<surname>Blevennec</surname>
							<given-names>G.L.</given-names>
						</name>
						<name>
							<surname>Serbutoviez</surname>
							<given-names>C.</given-names>
						</name>
						<name>
							<surname>Verilhac</surname>
							<given-names>J.M.</given-names>
						</name>
						<name>
							<surname>Yan</surname>
							<given-names>H.</given-names>
						</name>
						<name>
							<surname>Horowitz</surname>
							<given-names>G.</given-names>
						</name>
					</person-group>
					<source>J. Appl. Phys.</source>
					<volume>105</volume>
					<fpage>084510</fpage>
					<lpage>084510</lpage>
					<year>2009</year>
				</element-citation>
			</ref>
			<ref id="B22">
				<label>[22]</label>
				<mixed-citation> [22]. W.T. Wondmagegn, N.T. Satyala, R.J. Pieper, M.A. Quevedo-
					Lopez, S. Gowrisanker, H.N. Alshareef, H.J. Stiegler, B.E. Gnade, <italic>J
						Comput. Electron.</italic>
					<bold>10</bold>, 144 (2011).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Wondmagegn</surname>
							<given-names>W.T.</given-names>
						</name>
						<name>
							<surname>Satyala</surname>
							<given-names>N.T.</given-names>
						</name>
						<name>
							<surname>Pieper</surname>
							<given-names>R.J.</given-names>
						</name>
						<name>
							<surname>Quevedo- Lopez</surname>
							<given-names>M.A.</given-names>
						</name>
						<name>
							<surname>Gowrisanker</surname>
							<given-names>S.</given-names>
						</name>
						<name>
							<surname>Alshareef</surname>
							<given-names>H.N.</given-names>
						</name>
						<name>
							<surname>Stiegler</surname>
							<given-names>H.J.</given-names>
						</name>
						<name>
							<surname>Gnade</surname>
							<given-names>B.E.</given-names>
						</name>
					</person-group>
					<source>J Comput. Electron.</source>
					<volume>10</volume>
					<fpage>144</fpage>
					<lpage>144</lpage>
					<year>2011</year>
				</element-citation>
			</ref>
			<ref id="B23">
				<label>[23]</label>
				<mixed-citation> [23]. N. Koch, A. Kahn, J. Ghijsen, J.J. Pireaux, J. Schwartz, R.L.
					Johnson, A. Elschner, <italic>Appl. Phys. Lett.</italic>
					<bold>82</bold>, 70 (2003).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Koch</surname>
							<given-names>N.</given-names>
						</name>
						<name>
							<surname>Kahn</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Ghijsen</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Pireaux</surname>
							<given-names>J.J.</given-names>
						</name>
						<name>
							<surname>Schwartz</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Johnson</surname>
							<given-names>R.L.</given-names>
						</name>
						<name>
							<surname>Elschner</surname>
							<given-names>A.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>82</volume>
					<fpage>70</fpage>
					<lpage>70</lpage>
					<year>2003</year>
				</element-citation>
			</ref>
			<ref id="B24">
				<label>[24]</label>
				<mixed-citation> [24]. R.T. Tung, <italic>Phys. Rev. B</italic>, <bold>64</bold>,
					205310 (2001).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Tung</surname>
							<given-names>R.T.</given-names>
						</name>
					</person-group>
					<source>Phys. Rev. B</source>
					<volume>64</volume>
					<fpage>205310</fpage>
					<lpage>205310</lpage>
					<year>2001</year>
				</element-citation>
			</ref>
			<ref id="B25">
				<label>[25]</label>
				<mixed-citation> [25]. P.V. Necliudov, M.S. Shur, D.J. Gundlach, T.N. Jackson,
						<italic>Solid-State Electron.</italic>
					<bold>47</bold>, 259 (2003).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Necliudov</surname>
							<given-names>P.V.</given-names>
						</name>
						<name>
							<surname>Shur</surname>
							<given-names>M.S.</given-names>
						</name>
						<name>
							<surname>Gundlach</surname>
							<given-names>D.J.</given-names>
						</name>
						<name>
							<surname>Jackson</surname>
							<given-names>T.N.</given-names>
						</name>
					</person-group>
					<source>Solid-State Electron.</source>
					<volume>47</volume>
					<fpage>259</fpage>
					<lpage>259</lpage>
					<year>2003</year>
				</element-citation>
			</ref>
			<ref id="B26">
				<label>[26]</label>
				<mixed-citation> [26]. H.L. Cheng, Y.S. Mai, W.Y. Chou, L.R. Chang, X.W. Liang,
						<italic>Adv. Funct. Mater.</italic>
					<bold>17</bold>, 3639 (2007).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Cheng</surname>
							<given-names>H.L.</given-names>
						</name>
						<name>
							<surname>Mai</surname>
							<given-names>Y.S.</given-names>
						</name>
						<name>
							<surname>Chou</surname>
							<given-names>W.Y.</given-names>
						</name>
						<name>
							<surname>Chang</surname>
							<given-names>L.R.</given-names>
						</name>
						<name>
							<surname>Liang</surname>
							<given-names>X.W.</given-names>
						</name>
					</person-group>
					<source>Adv. Funct. Mater.</source>
					<volume>17</volume>
					<fpage>3639</fpage>
					<lpage>3639</lpage>
					<year>2007</year>
				</element-citation>
			</ref>
			<ref id="B27">
				<label>[27]</label>
				<mixed-citation> [27]. R. Matsubara, N. Ohashi, M. Sakai, K. Kudo, M. Nkamura,
						<italic>Appl. Phys. Lett.</italic>
					<bold>92</bold>, 242108 (2008).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Matsubara</surname>
							<given-names>R.</given-names>
						</name>
						<name>
							<surname>Ohashi</surname>
							<given-names>N.</given-names>
						</name>
						<name>
							<surname>Sakai</surname>
							<given-names>M.</given-names>
						</name>
						<name>
							<surname>Kudo</surname>
							<given-names>K.</given-names>
						</name>
						<name>
							<surname>Nkamura</surname>
							<given-names>M.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>92</volume>
					<fpage>242108</fpage>
					<lpage>242108</lpage>
					<year>2008</year>
				</element-citation>
			</ref>
			<ref id="B28">
				<label>[28]</label>
				<mixed-citation> [28]. B. Bräuer, R. Kukreja, A. Virkar, H.B. Akkerman, A. Fognini,
					T. Tyliszczac, Z. Bao, <italic>Organic Electron.</italic>
					<bold>12</bold>, 1936 (2011). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Bräuer</surname>
							<given-names>B.</given-names>
						</name>
						<name>
							<surname>Kukreja</surname>
							<given-names>R.</given-names>
						</name>
						<name>
							<surname>Virkar</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Akkerman</surname>
							<given-names>H.B.</given-names>
						</name>
						<name>
							<surname>Fognini</surname>
							<given-names>A.</given-names>
						</name>
						<name>
							<surname>Tyliszczac</surname>
							<given-names>T.</given-names>
						</name>
						<name>
							<surname>Bao</surname>
							<given-names>Z.</given-names>
						</name>
					</person-group>
					<source>Organic Electron.</source>
					<volume>12</volume>
					<fpage>1936</fpage>
					<lpage>1936</lpage>
					<year>2011</year>
				</element-citation>
			</ref>
			<ref id="B29">
				<label>[29]</label>
				<mixed-citation> [29]. E.J. Meijer, G.H. Gelinck, E. van Veenendaal, B.H. Huisman,
					D.M. de Leeuw, T.M. Klapwijk, <italic>Appl. Phys. Lett.</italic>
					<bold>82</bold>, 4576 (2003). </mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Meijer</surname>
							<given-names>E.J.</given-names>
						</name>
						<name>
							<surname>Gelinck</surname>
							<given-names>G.H.</given-names>
						</name>
						<name>
							<surname>van Veenendaal</surname>
							<given-names>E.</given-names>
						</name>
						<name>
							<surname>Huisman</surname>
							<given-names>B.H.</given-names>
						</name>
						<name>
							<surname>de Leeuw</surname>
							<given-names>D.M.</given-names>
						</name>
						<name>
							<surname>Klapwijk</surname>
							<given-names>T.M.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>82</volume>
					<fpage>4576</fpage>
					<lpage>4576</lpage>
					<year>2003</year>
				</element-citation>
			</ref>
			<ref id="B30">
				<label>[30]</label>
				<mixed-citation> [30]. T. Ahn, H.J. Suk, J. Won, M.H. Yi, <italic>Microelectron.
						Eng.</italic>
					<bold>86</bold>, 41 (2009).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Ahn</surname>
							<given-names>T.</given-names>
						</name>
						<name>
							<surname>Suk</surname>
							<given-names>H.J.</given-names>
						</name>
						<name>
							<surname>Won</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Yi</surname>
							<given-names>M.H.</given-names>
						</name>
					</person-group>
					<source>Microelectron. Eng.</source>
					<volume>86</volume>
					<fpage>41</fpage>
					<lpage>41</lpage>
					<year>2009</year>
				</element-citation>
			</ref>
			<ref id="B31">
				<label>[31]</label>
				<mixed-citation> [31]. J. Li, H.P. Lin, F. Zhou, W.Q. Zhu, X.Y. Jiang, Z.L. Zhang,
						<italic>Curr. Appl. Phys.</italic>
					<bold>12</bold>, 280 (2012).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Li</surname>
							<given-names>J.</given-names>
						</name>
						<name>
							<surname>Lin</surname>
							<given-names>H.P.</given-names>
						</name>
						<name>
							<surname>Zhou</surname>
							<given-names>F.</given-names>
						</name>
						<name>
							<surname>Zhu</surname>
							<given-names>W.Q.</given-names>
						</name>
						<name>
							<surname>Jiang</surname>
							<given-names>X.Y.</given-names>
						</name>
						<name>
							<surname>Zhang</surname>
							<given-names>Z.L.</given-names>
						</name>
					</person-group>
					<source>Curr. Appl. Phys.</source>
					<volume>12</volume>
					<fpage>280</fpage>
					<lpage>280</lpage>
					<year>2012</year>
				</element-citation>
			</ref>
			<ref id="B32">
				<label>[32]</label>
				<mixed-citation> [32]. J.E. Northrup, M.L. Chabinyc, <italic>Phys. Rev. B</italic>
					<bold>68</bold>, 041202(R) (2003).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Northrup</surname>
							<given-names>J.E.</given-names>
						</name>
						<name>
							<surname>Chabinyc</surname>
							<given-names>M.L.</given-names>
						</name>
					</person-group>
					<source>Phys. Rev. B</source>
					<volume>68</volume>
					<fpage>041202(R)</fpage>
					<lpage>041202(R)</lpage>
					<year>2003</year>
				</element-citation>
			</ref>
			<ref id="B33">
				<label>[33]</label>
				<mixed-citation> [33]. C.D. Dimitrakopoulos, D.J. Mascaro, <italic>IBM J. Res.
						Dev.</italic>
					<bold>45</bold>, 11 (2001).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Dimitrakopoulos</surname>
							<given-names>C.D.</given-names>
						</name>
						<name>
							<surname>Mascaro</surname>
							<given-names>D.J.</given-names>
						</name>
					</person-group>
					<source>IBM J. Res. Dev.</source>
					<volume>45</volume>
					<fpage>11</fpage>
					<lpage>11</lpage>
					<year>2001</year>
				</element-citation>
			</ref>
			<ref id="B34">
				<label>[34]</label>
				<mixed-citation> [34]. D.J. Gundlach, T.N. Jackson, D.G. Schlom, S.F. Nelson,
						<italic>Appl. Phys. Lett.</italic>
					<bold>74</bold>, 3302 (1999).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Gundlach</surname>
							<given-names>D.J.</given-names>
						</name>
						<name>
							<surname>Jackson</surname>
							<given-names>T.N.</given-names>
						</name>
						<name>
							<surname>Schlom</surname>
							<given-names>D.G.</given-names>
						</name>
						<name>
							<surname>Nelson</surname>
							<given-names>S.F.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>74</volume>
					<fpage>3302</fpage>
					<lpage>3302</lpage>
					<year>1999</year>
				</element-citation>
			</ref>
			<ref id="B35">
				<label>[35]</label>
				<mixed-citation> [35]. Z.T. Zhu, J.T. Mason, R. Dieckmann, G.G. Malliaras,
						<italic>Appl. Phys. Lett.</italic>
					<bold>81</bold>, 24 (2002).</mixed-citation>
				<element-citation publication-type="journal">
					<person-group person-group-type="author">
						<name>
							<surname>Zhu</surname>
							<given-names>Z.T.</given-names>
						</name>
						<name>
							<surname>Mason</surname>
							<given-names>J.T.</given-names>
						</name>
						<name>
							<surname>Dieckmann</surname>
							<given-names>R.</given-names>
						</name>
						<name>
							<surname>Malliaras</surname>
							<given-names>G.G.</given-names>
						</name>
					</person-group>
					<source>Appl. Phys. Lett.</source>
					<volume>81</volume>
					<fpage>24</fpage>
					<lpage>24</lpage>
					<year>2002</year>
				</element-citation>
			</ref>
		</ref-list>
	</back>
</article>
