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	<front>
		<journal-meta>
			<journal-id journal-id-type="publisher-id">sv</journal-id>
			<journal-title-group>
				<journal-title>Superficies y vacío</journal-title>
				<abbrev-journal-title abbrev-type="publisher">Superf. vacío</abbrev-journal-title>
			</journal-title-group>
			<issn pub-type="ppub">1665-3521</issn>
			<publisher>
				<publisher-name>Sociedad Mexicana de Ciencia y Tecnología de Superficies y
					Materiales A.C.</publisher-name>
			</publisher>
		</journal-meta>
		<article-meta>
			<article-id pub-id-type="publisher-id">00001</article-id>
			<article-categories>
				<subj-group subj-group-type="heading">
					<subject>Research Papers</subject>
				</subj-group>
			</article-categories>
			<title-group>
				<article-title>Thin films of CdS:Cu, morphological, optical, structural and
					electrical properties</article-title>
			</title-group>
			<contrib-group>
				<contrib contrib-type="author">
					<name>
						<surname>Rodriguez</surname>
						<given-names>F.J.S.</given-names>
					</name>
					<xref ref-type="aff" rid="aff1"><sup>1</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Angulo-Rocha</surname>
						<given-names>J.</given-names>
					</name>
					<xref ref-type="aff" rid="aff1"><sup>1</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Ramos-Brito</surname>
						<given-names>F.</given-names>
					</name>
					<xref ref-type="aff" rid="aff1"><sup>1</sup></xref>
					<xref ref-type="corresp" rid="c1"><sup>*</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Yee-Rendón</surname>
						<given-names>C.M.</given-names>
					</name>
					<xref ref-type="aff" rid="aff2"><sup>2</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>García-Hipólito</surname>
						<given-names>M.</given-names>
					</name>
					<xref ref-type="aff" rid="aff3"><sup>3</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Aguilar-Frutis</surname>
						<given-names>M.</given-names>
					</name>
					<xref ref-type="aff" rid="aff4"><sup>4</sup></xref>
				</contrib>
				<contrib contrib-type="author">
					<name>
						<surname>Castillo</surname>
						<given-names>S.J.</given-names>
					</name>
					<xref ref-type="aff" rid="aff5"><sup>5</sup></xref>
				</contrib>
			</contrib-group>
			<aff id="aff1">
				<label>1</label>
				<institution content-type="original">Laboratorio de Síntesis de Materiales, Facultad
					de Ciencias Físico-Matemáticas, Universidad Autónoma de Sinaloa Culiacán, Sin.
					80010 México</institution>
				<institution content-type="normalized">Universidad Autónoma de Sinaloa</institution>
				<institution content-type="orgdiv1">Laboratorio de Síntesis de
					Materiales</institution>
				<institution content-type="orgdiv2">Facultad de Ciencias
					Físico-Matemáticas</institution>
				<institution content-type="orgname">Universidad Autónoma de Sinaloa</institution>
				<addr-line>
					<state>Culiacán</state>
					<postal-code>80010</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<aff id="aff2">
				<label>2</label>
				<institution content-type="original">Laboratorio de Óptica, Facultad de Ciencias
					Físico-Matemáticas, Universidad Autónoma de Sinaloa Culiacán, Sin. 80010
					México</institution>
				<institution content-type="normalized">Universidad Autónoma de Sinaloa</institution>
				<institution content-type="orgdiv1">Laboratorio de Óptica</institution>
				<institution content-type="orgdiv2">Facultad de Ciencias
					Físico-Matemáticas</institution>
				<institution content-type="orgname">Universidad Autónoma de Sinaloa</institution>
				<addr-line>
					<state>Culiacán</state>
					<postal-code>80010</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<aff id="aff3">
				<label>3</label>
				<institution content-type="original">Instituto de Investigaciones en Materiales,
					Universidad Nacional Autónoma de México Coyoacán, Cd. Méx. 04150
					México</institution>
				<institution content-type="normalized">Universidad Nacional Autónoma de
					México</institution>
				<institution content-type="orgdiv1">Instituto de Investigaciones en
					Materiales</institution>
				<institution content-type="orgname">Universidad Nacional Autónoma de
					México</institution>
				<addr-line>
					<city>Cd. Méx.</city>
					<postal-code>04150</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<aff id="aff4">
				<label>4</label>
				<institution content-type="original">Centro de Investigación en Ciencia Aplicada y
					Tecnología Avanzada-Legaría, del Instituto Politécnico Nacional Miguel Hidalgo,
					Cd. Méx. 11500 México</institution>
				<institution content-type="normalized">Instituto Politécnico Nacional</institution>
				<institution content-type="orgdiv1">Centro de Investigación en Ciencia Aplicada y
					Tecnología Avanzada-Legaría</institution>
				<institution content-type="orgname">Instituto Politécnico Nacional</institution>
				<addr-line>
					<city>Cd. Méx.</city>
					<postal-code>11500</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<aff id="aff5">
				<label>5</label>
				<institution content-type="original">Departamento de Investigación en Física,
					Universidad de Sonora Hermosillo, Son. 83000 México</institution>
				<institution content-type="normalized">Universidad de Sonora</institution>
				<institution content-type="orgdiv1">Departamento de Investigación en
					Física</institution>
				<institution content-type="orgname">Universidad de Sonora</institution>
				<addr-line>
					<state>Hermosillo</state>
					<postal-code>83000</postal-code>
				</addr-line>
				<country country="MX">Mexico</country>
			</aff>
			<author-notes>
				<corresp id="c1">
					<label><sup>*</sup></label>
					<email>framosbrito@uas.edu .mx</email>
				</corresp>
			</author-notes>
			<pub-date date-type="pub" publication-format="electronic">
				<day>26</day>
				<month>06</month>
				<year>2020</year>
			</pub-date>
			<pub-date date-type="collection" publication-format="electronic">
				<month>09</month>
				<year>2016</year>
			</pub-date>
			<volume>29</volume>
			<issue>03</issue>
			<fpage>62</fpage>
			<lpage>69</lpage>
			<history>
				<date date-type="received">
					<day>02</day>
					<month>05</month>
					<year>2016</year>
				</date>
				<date date-type="accepted">
					<day>08</day>
					<month>07</month>
					<year>2016</year>
				</date>
			</history>
			<permissions>
				<license license-type="open-access"
					xlink:href="https://creativecommons.org/licenses/by-nc/4.0/" xml:lang="en">
					<license-p>This is an open-access article distributed under the terms of the
						Creative Commons Attribution License</license-p>
				</license>
			</permissions>
			<abstract>
				<title>Abstract</title>
				<p>Thin solid films of CdS:Cu were synthesized using a wet-chemical. Doping was by
					thermal diffusion. Films were obtained as a function of: precursor salts,
					deposition time and annealing temperature. Studies of transmittance,
					resistivity, photoluminescence at room temperature, X-ray diffraction,
					high-resolution scanning and transmission electron microscopies, were performed.
					The CdS and CdS:Cu films obtained had an average thickness of 130 nm and 160 nm,
					respectively. This study provides evidence of the greater effectiveness of
					sodium citrate than ammonium chloride as a complexing agent. The crystalline
					phase of the films was cubic and did not vary with deposition time or the
					precursor. Studies were consistent in showing a film made up of regularly
					spaced, asterisk-shaped entities of about 35 nm in size, which in turn were
					composed of nanocrystals smaller than 10 nm. The resulting films behaved as an
					n-type semiconductor with an energy gap of about 2.38 eV that varied only
					slightly with deposition time and the precursors' nature, but increased to 2.93
					eV with Cu doping. The resistivity achieved was 5.822 × 10<sup>-5</sup> Ω-cm.
					The PL emission spectra showed variation in optical quality and revealed a
					de-excitation mechanism due to the presence of cadmium vacancies, sulfur
					vacancies and interstitial cadmium.</p>
			</abstract>
			<kwd-group xml:lang="en">
				<title>Keywords:</title>
				<kwd>CdS film</kwd>
				<kwd>Cu-doped CdS</kwd>
				<kwd>Low-resistivity CdS</kwd>
				<kwd>Cu nanoparticles</kwd>
			</kwd-group>
			<counts>
				<fig-count count="12"/>
				<table-count count="0"/>
				<equation-count count="1"/>
				<ref-count count="38"/>
				<page-count count="08"/>
			</counts>
		</article-meta>
	</front>
	<body>
		<sec sec-type="intro">
			<title>Introduction</title>
			<p>The chemical bath deposition (CBD) method is a simple and inexpensive technique that
				has been widely applied to the fabrication of semiconductor layers for photovoltaic
				applications [<xref ref-type="bibr" rid="B1">1</xref>]. CdS is an n-type
				semiconductor material with a band gap of about 2.42 eV that can be easily deposited
				by CBD [<xref ref-type="bibr" rid="B2">2</xref>]. CdS has been used in various
				applications like optoelectronic devices (solar cells) [<xref ref-type="bibr"
					rid="B2">2</xref>-<xref ref-type="bibr" rid="B5">5</xref>], TFT transistors and
				CMOS circuits, among others [<xref ref-type="bibr" rid="B6">6</xref>-<xref
					ref-type="bibr" rid="B9">9</xref>]. It has been reported that different S/Cd
				ratios during reactions can modify the characteristics of CdS film [<xref
					ref-type="bibr" rid="B10">10</xref>]. The electrical resistivity of CdS can be
				controlled by applying different annealing treatments or by varying the deposition
				time, atmosphere and thiourea concentration during the CBD process [<xref
					ref-type="bibr" rid="B11">11</xref>]. Other studies have shown that the
				electrical characteristics of CdS can be changed by doping with Mn, Cu, Ni, Co, Ga,
				B, Ag, etc. [<xref ref-type="bibr" rid="B12">12</xref>-<xref ref-type="bibr"
					rid="B19">19</xref>]. In some studies, CdS was even converted into a p-type
				semiconductor [<xref ref-type="bibr" rid="B20">20</xref>]. In this research, CdS
				thin films were synthesized by chemical bath deposition and behaved as an n-type
				semiconductor. The CdS films were doped with copper through diffusion of 80-nm-thick
				copper films into the films under annealing treatments. Several properties of the
				films were studied, including crystalline structure, chemical composition,
				morphology and optical properties.</p>
		</sec>
		<sec>
			<title>Experimental details</title>
			<p>CdS thin films were deposited on Corning 7051 glass substrates by using two different
				precursor solutions with the following formulations:</p>
			
			
			
			<disp-quote><p>A. 50 ml of deionized water, 4 ml of 0.1 M cadmium nitrate tetrahydrate
					(Cd(NO<sub>3</sub>)<sub>2</sub> 4H<sub>2</sub>O), 20 ml of 0.5 M ammonium
				chloride (NH<sub>4</sub>Cl), 5 ml of 0.3 M potassium hydroxide (KOH), 5 ml of
				buffer, pH 11 [NH<sub>4</sub>OH/NH<sub>4</sub>Cl] and 10 ml of 0.5 M thiourea
				SC(NH<sub>2</sub>)<sub>2</sub>; and</p></disp-quote>
				<disp-quote><p>B. 50 ml of deionized water, 4 ml of 0.1 M cadmium nitrate tetrahydrate
					(Cd(NO<sub>3</sub>)<sub>2</sub> 4H<sub>2</sub>O), 20 ml of 0.5 M sodium citrate
					(Na<sub>3</sub>C<sub>6</sub>H<sub>5</sub>O<sub>7</sub>), 5 ml of 0.3 M potassium
				hydroxide (KOH), 5 ml of buffer, pH 11 [NH<sub>4</sub>OH/NH<sub>4</sub>Cl] and 10 ml
					of 0.5 M thiourea SC(NH<sub>2</sub>)<sub>2</sub>.</p></disp-quote>
			<p>The mixtures were placed at 77.7 °C in a thermal water bath without stirring.
				Substrates were vertically immersed in the solution and removed after 55 or 90
				minutes, to get A-55, A-90, B-55 and B-90 CdS samples where A and B indicate
				precursor solution and 55, 90 indicate deposition time.</p>
			<p>The samples were of a homogeneous yellowish color, were specularly reflecting and had
				very good adhesion to the substrate. The thickness of the films was measured using a
				KLA-Tencor P-15 surface profiler. The films had an average thickness of 130 nm
					(<xref ref-type="fig" rid="f1">Figure 1</xref>). The B-90 film was selected to
				be doped with copper due to the best optical and morphological properties. Using an
				evaporation method, a metallic copper layer of about 80 nm thickness was deposited
				over the B-90 film (<xref ref-type="fig" rid="f1">Figure 1</xref>), which were then
				subjected to different annealing temperatures (T<sub>a</sub>) equal to 140, 170, 200
				and 230 °C for 20 minutes, in order to allow copper diffusion into the films. The
				conditions to get the Cu film evaporated on the CdS layer was not so finely
				controlled, substrate temperature is room temperature, and the source metal is
				copper vacuum gasket bites; after to arrive the tungsten resistance-filament to 30
				Amps, the ceramic crucible start to evaporate the copper bites, coating the CdS
				layer and the window chamber in around 4 minutes; when start the vacuum thermal
				deposition, the pressure is around 1×10<sup>-4</sup> Torr. Being a thickness of 80
				nm. The CdS:Cu samples were labeled as: B-90-140, B-90-170, B-90-200 and B-90-230
				for T<sub>a</sub> = 140, 170, 200 and 230 °C, respectively. The copper-covered B-90
				film that was not thermally annealed was labeled as B-90-T<sub>room</sub>. A JEOL
				JSM-7600 field-emission scanning electron microscope (SEM) equipped with a beryllium
				window X-ray detector was used to obtain morphology and chemical composition of the
				samples. This equipment has two secondary electron detectors: an upper detector
				(SEI) and a lower detector (LEI) also it has a backscattered electron detector that
				can collect electrons at low takeoff angle (LABE) which are extremely sensitive to
				subtle changes in localized topography of the sample surface and give information on
				compositional differences or on the inner structure of samples. A JEOL 2010F TEM
				field-emission transmision electron microscope (TEM) was used to obtain morphology
				and crystalline structure of de samples. Chemical composition analysis was performed
				by energy dispersive spectroscopy (EDS). Roughness of the surface films was measured
				by atomic force microscopy (AFM) with an AFM system (Nanoscope III). Crystalline
				structure was analyzed by X-ray diffraction (XRD) using a Rigaku Ultima IV X-Ray
				diffractometer with Cu kɑ radiation (40 kV/44 mA, 0.5 °/min, 10 ≤ 2θ ≤ 50,
					<italic>λ</italic> = 0.15418 nm) at normal incident. Identification of the
				hexagonal phase and indexing of the peaks in the XRD patterns were carried out using
				JCPDS card #41-1049 for cadmium sulphide, JCPDS card #35-1091 for copper oxide,
				JCPDS card #653288 for cubic Cu<sub>2</sub>O, and JCPDS card #04-0836 for
				copper.</p>
			<p>
				<fig id="f1">
					<label>Figure 1</label>
					<caption>
						<title>Surface profilometry measurement of: a) B-90 and b) B-90-Troom films,
							deposited by CBD and CBD followed by evaporation, respectively.</title>
					</caption>
					<graphic xlink:href="1665-3521-sv-29-03-62-gf1.png"/>
				</fig>
			</p>
			<p>Photoluminescence (PL) excitation and emission spectra at room temperature
					(T<sub>room</sub>) were recorded using a spectrofluorometer SPEX Fluoro-Max-P
				Lamp intensity correction is performed automatically by this instrument: it measures
				excitation light intensity with an additional photomultiplier tube and performs the
				correction accordingly before displaying the data. The absorption spectra of the
				films were measured by Cary 5000 spectrophotometer (Varian and Avantes
				AvaSpec-2048-USB) in the range from 350 nm to 800 nm. Resistivity was measured using
				an Ecopia HMS-3000 Hall Measurement System which provides precision measurements
				with percentual uncertainty less than 5 %.</p>
		</sec>
		<sec sec-type="results|discussion">
			<title>Results and discussion</title>
			<sec>
				<title><italic>Morphology</italic></title>
				<p>
					<xref ref-type="fig" rid="f2">Figure 2</xref> shows changes in the morphology of
					the CdS films obtained from the formulation with ammonium chloride as a
					complexing agent and deposition times of 55 and 90 minutes. Both A-55 and A-90
					films were composed of submicron spherical-shaped particles with few particles
					bigger than the average size. Average particle size was higher for A-90,
					indicating that a higher deposition time produces bigger particles. The A-55 and
					A-90 films had discontinuous surfaces with free spaces of about 600 nm and 400
					nm, average particle sizes of 71.3 nm and 112 nm, and particle-size distribution
					functions with Full Width at Half Maximu (FWHM) of 0.50291 nm and 0.37171 nm,
					respectively. Both films showed nodular growth. It is worth noting that higher
					deposition times allowed the coalescence of nanoparticles, hence minimizing the
					number of free spaces and, apparently, film roughness (see <xref ref-type="fig"
						rid="f2">Figures 2 c and 2d</xref>).</p>
				<p>
					<fig id="f2">
						<label>Figure 2</label>
						<caption>
							<title>SEM micrographs of A-55 and A-90 samples at different
								magnifications.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf2.png"/>
					</fig>
				</p>
				<p>
					<xref ref-type="fig" rid="f3">Figure 3</xref> shows changes in the morphology of
					CdS films obtained from the formulation with sodium citrate as a complexing
					agent and deposition times of 55 and 90 minutes. Both B-55 and B-90 films had
					continuous surfaces, without cracks, made of splinter-shaped nanoparticles. The
					films showed a few submicron particles resulting from the coalescence of
					nanoparticles, achieving sizes of 500 nm for the B-90 film and 400 nm for the
					B-55 film (see <xref ref-type="fig" rid="f3">Figures 3a and 3b</xref>). This
					translated into surfaces with heterogeneous morphology.</p>
				<p>
					<fig id="f3">
						<label>Figure 3</label>
						<caption>
							<title>SEM micrographs of the B-55 and B-90 samples at different
								magnifications.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf3.png"/>
					</fig>
				</p>
				<p>The micrographs of both films showed only a few black spots indicating zones with
					different chemical compositions. This suggests that films had a nearly
					homogeneous chemical composition.</p>
				<p>B-55 and B-90 films showed splinter-shaped particles with width distribution
					functions centered at 31.7 nm and 37.5 nm, and FWHM of 0.603 nm and 0.5198 nm,
					respectively. At first, film roughness appeared to be in the nanometric range,
					like the width of the splinters. The average size of splinters increased with
					deposition time, indicating that a higher deposition time produces bigger
					splinters.</p>
				<p>From the above, it appears that the B-90 film resulted in a better morphology for
					potential solar cell applications.</p>
				<p>
					<xref ref-type="fig" rid="f4">Figure 4</xref> shows a SEM micrograph in LABE
					mode of the copper film deposited on the B-90-Troom sample, in order to examine
					its morphology for the purpose of copper doping. The film turned out to be
					continuous and without cracks, with a few particles of submicron dimensions
					(~500 nm). There are three things worth mentioning about the copper film: 1) The
					film appeared to have a uniform chemical composition across its surface; 2) The
					film's surface was composed of spherical-shaped nanoparticles; and 3) At first
					glance, film roughness appeared to be in the nanometric range.</p>
				<p>
					<fig id="f4">
						<label>Figure 4</label>
						<caption>
							<title>SEM micrograph for B-90-T<sub>room</sub> sample</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf4.png"/>
					</fig>
				</p>
				<p>
					<xref ref-type="fig" rid="f5">Figure 5</xref> shows the morphology of the
						B-90-T<sub>a</sub> film as a function of T<sub>a</sub>. <xref ref-type="fig"
						rid="f5">Figures 5 a, 5c, 5e and 5g</xref> show micrographs of
						B-90-T<sub>a</sub> samples for T<sub>a</sub> = 140, 170, 200 and 230 °C,
					respectively. The micrographs reveal a surface composed of spherical-shaped
					particles and the presence of relatively big particles and potholes. The films
					annealed at 140 and 170 °C turned out to be morphologically similar (<xref
						ref-type="fig" rid="f5">Figure 5d</xref>) but had different average particle
					size: 160 nm and 38 nm, respectively.</p>
				<p>
					<fig id="f5">
						<label>Figure 5</label>
						<caption>
							<title>SEM micrographs of the samples B-90-T<sub>a</sub> for
									T<sub>a</sub> = 140, 170, 200 and 230 °C. <xref ref-type="fig"
									rid="f5">Figure 5b</xref> shows the backscattered electron image
								of the cross section of the sample B-90-140.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf5.png"/>
					</fig>
				</p>
				<p>For T<sub>a</sub> of 200 °C and higher, however, there was a change in
					morphology, with film surfaces composed of nanoclusters of spherical-shaped
					nanoparticles of 10 nm diameter, as shown in <xref ref-type="fig" rid="f5"
						>Figures 5 f and 5h</xref>. The average size of the clusters was of 65 nm
					and 56 nm for T<sub>a</sub> = 200 and 230 °C, respectively. At first glance,
					film roughness appeared to be in the nanometric range. It is evident from the
					lower secondary electron images in <xref ref-type="fig" rid="f5">Figures 5a, 5c,
						5e and 5g</xref> that the films had a homogeneous chemical composition
					across their surface for all T<sub>a</sub> values.</p>
				<p>
					<xref ref-type="fig" rid="f5">Figure 5b</xref> shows a micrograph of a cross
					section of the B-90-140 sample obtained by using low-angle backscattered
					electrons (LABE). A bilayer film of about 160 nm is observed, a result
					representative of all synthesized samples.</p>
				<p>The upper film was 15 nm thick on average, but was thicker in certain zones. The
					inset in <xref ref-type="fig" rid="f5">figure 5b</xref> shows an EDS analysis of
					the zone evidencing that Cu ions were incorporated into the film.</p>
			</sec>
			<sec>
				<title><italic>Crystalline structure</italic></title>
				<p>The crystalline structure of the A-55, A-90, B-55 and B-90 samples was obtained
					by XRD. <xref ref-type="fig" rid="f6">Figure 6</xref> shows that the crystalline
					phase of CdS films was cubic and did not vary with deposition time or the
					formulation, which is consistent with the results of Atefeh Jafari et al. [<xref
						ref-type="bibr" rid="B21">21</xref>]. The XRD pattern showed a wide band and
					three main peaks c entered at 2θ = 24.89 °, 26.51 ° and 43.99 °. The wide band
					was attributed to amorphous material. The peak centered at 2θ = 24.89 °,
					particularly the highest diffraction peak (111), was attributed to the presence
					of monoclinic CdSO<sub>4</sub>-H<sub>2</sub>O [<xref ref-type="bibr" rid="B22"
						>22</xref>].</p>
				<p>
					<fig id="f6">
						<label>Figure 6</label>
						<caption>
							<title>XRD patterns of the CdS samples</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf6.png"/>
					</fig>
				</p>
				<p>Indeed, this peak disappeared after thermal annealing, used to diffuse copper
					into the CdS film (see <xref ref-type="fig" rid="f8">Figure 8</xref>). The peaks
					centered at 2θ = 26.51 ° and 43.99 ° were attributed to the (111) and (110)
					planes of the cubic crystalline phase of CdS. All samples had a lattice constant
					of 5.8196 Å and a preferred growth orientation along the (111) plane.</p>
				
				<p>The crystalline grain sizes were obtained by Debye-Scherrer formula [<xref
						ref-type="bibr" rid="B23">23</xref>]:</p>
				<p>
					<disp-formula>
						<mml:math>
							<mml:mi>D</mml:mi>
							<mml:mi> </mml:mi>
							<mml:mo>=</mml:mo>
							<mml:mi> </mml:mi>
							<mml:mfrac>
								<mml:mrow>
									<mml:mn>0.9</mml:mn>
									<mml:mi>λ</mml:mi>
								</mml:mrow>
								<mml:mrow>
									<mml:mi>β</mml:mi>
									<mml:mrow>
										<mml:mrow>
											<mml:mi mathvariant="normal">cos</mml:mi>
										</mml:mrow>
										<mml:mo>⁡</mml:mo>
										<mml:mrow>
											<mml:mi>θ</mml:mi>
										</mml:mrow>
									</mml:mrow>
								</mml:mrow>
							</mml:mfrac>
						</mml:math>
					</disp-formula>
				</p>
				<p>Where: D = crystalline grain size, λ = CuKɑ radiation at 1.5426 Å, β = Full Width
					at Half Maximum of diffraction peak and θ = half of 2θ diffraction angle . The
					calculated D values were: 31.4 nm, 20.4 nm, 19.4 nm and 14.5 nm for the A-90,
					B-90, A-55 and B-55 films, respectively. This provides evidence of the greater
					effectiveness of sodium citrate (Formulation 3) than ammonium chloride
					(Formulation 2) as a complexing agent.</p>
				<p>In <xref ref-type="fig" rid="f7">Figure 7</xref>, the B-90 sample showed a film
					containing regularly spaced, asterisk-shaped black entities. These asterisks had
					a narrow size distribution function centered at 30 - 40 nm and were composed of
					several superposed nanocrystals smaller than 10 nm (<xref ref-type="fig"
						rid="f7">Figure 7d</xref>). This is consistent with the average grain size
					obtained by XRD. These nanocrystals showed crystalline planes located far away
					from each other at 3.33 Å, corresponding to the (111) planes of cubic CdS (Inset
					in <xref ref-type="fig" rid="f7">figure 7d</xref>). The electron diffraction
					pattern of the film (Inset in <xref ref-type="fig" rid="f7">figure 7e</xref>)
					showed crystalline planes corresponding to the (111) planes of cubic CdS, with
					d(111) = 3.35 Å. This resulted in a lattice constant of 5.8024 Å, which is
					consistent with the lattice constant of 5.8196 Å obtained by XRD.</p>
				<p>
					<fig id="f7">
						<label>Figure 7</label>
						<caption>
							<title>TEM image of the B-90 sample.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf7.png"/>
					</fig>
				</p>
				<p>
					<xref ref-type="fig" rid="f8">Figure 8</xref> shows the XRD pattern of the
						B-90-T<sub>a</sub> samples as a function of T<sub>a</sub>, as well as the
					diffraction pattern of the B-90-T<sub>room</sub> sample, that is, the sample
					that had a copper film deposited on its surface, but was not heat treated. The
					first sample showed peaks centered at 27.3 ° and 44.61 °, as well as a wideband.
					The peaks were attributed to the (111) and (220) planes of cubic CdS, and the
					wideband, to material that was still crystallizing and/or the amorphous copper
					film deposited by thermal evaporation [<xref ref-type="bibr" rid="B24"
					>24</xref>].</p>
				<p>
					<fig id="f8">
						<label>Figure 8</label>
						<caption>
							<title>X-ray diffraction patterns as a function of T<sub>a</sub> of the
								B-90-T<sub>a</sub> samples and of the B-90-T<sub>room</sub>
								sample.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf8.png"/>
					</fig>
				</p>
				<p>After thermal annealing, the XRD pattern presented peaks at 26.76 °, 36.3 °, 43.3
					°, 44.25 °, 50.6 ° and 52.4 °. The peaks centered at 26.76 °, 44.25 ° and 52.4 °
					were attributed to the (111), (220) and (311) planes of cubic CdS [<xref
						ref-type="bibr" rid="B21">21</xref>]. The peaks centered at 43.3 ° and 50.6
					° belonged to cubic copper [<xref ref-type="bibr" rid="B25">25</xref>]. The peak
					centered at 36.3 ° as well as the low-intensity peaks in the region of 25 - 26 °
					were attributed to traces of hexagonal CdS, in agreement with Kashiwaba et al.
						[<xref ref-type="bibr" rid="B26">26</xref>].</p>
				<p>Although it might be thought that the 36.3 ° peak could correspond to the (111)
					planes of cubic Cu<sub>2</sub>O [<xref ref-type="bibr" rid="B25">25</xref>],
					this could not be the case here because Cu<sub>2</sub>O is formed simply by
					exposing copper to the oxygen in the air, and this 36.3 ° peak was not observed
					in the diffraction pattern of the B-90-T<sub>room</sub> sample, which had a
					copper film exposed to the air for a long time. The average grain size for cubic
					CdS, hexagonal CdS and cubic Cu was 16 nm, 8 nm and 13 nm, respectively. The
					sample that was thermally annealed at T<sub>a</sub> = 140 °C was the only one
					not showing CdS in its hexagonal phase.</p>
				<p>All thin films showed CdS mainly in its cubic crystalline phase and a
					preferential growth along the (111) planes. <xref ref-type="fig" rid="f8">Figure
						8</xref> shows a shift of cubic peaks towards lower 2θ values, indicating a
					uniform expansion of the CdS lattice as copper replaced Cd. There are two things
					worth mentioning in the XRD pattern of the B-90-T<sub>a</sub> films as a
					function of T<sub>a</sub>: the presence of cubic copper at T<sub>a</sub> = 140
					°C, which disappears as T<sub>a</sub> increases; and the presence of hexagonal
					CdS, starting at T<sub>a</sub> = 170 °C and becoming more evident as
						T<sub>a</sub> increases.</p>
			</sec>
			<sec>
				<title><italic>Electrical properties</italic></title>
				<p>
					<xref ref-type="fig" rid="f9">Figure 9</xref> shows the resistivity of
					copper-doped CdS film as a function of T<sub>a</sub>. It can be observed that
					resistivity decreased drastically as T<sub>a</sub> decreased, which seemed to be
					associated with a higher amount of crystalline copper and/or the predominance of
					cubic CdS over hexagonal CdS, in accordance with the results shown in the
					section <italic>Crystalline structure</italic> above. Further studies are
					required, however, to clarify the relationship among the above factors, and this
					is foreseen as future work. The lowest resistivity obtained was 5.822 χ
						10<sup>-5</sup> Ω-cm for the B-90-140 sample, which showed the highest
					amount of cubic copper and no hexagonal CdS.</p>
				<p>
					<fig id="f9">
						<label>Figure 9</label>
						<caption>
							<title>Electrical resistivity of copper-doped CdS film as a function of
									T<sub>a</sub>, measured by Hall effect.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf9.png"/>
					</fig>
				</p>
			</sec>
			<sec>
				<title><italic>Optical properties</italic></title>
				<p>The absorbance spectra of the A-90, A-55, B-90 and B-55 samples are shown in
						<xref ref-type="fig" rid="f10">Figure 10</xref>.</p>
				<p>
					<fig id="f10">
						<label>Figure 10</label>
						<caption>
							<title>a) Absorbance spectra of the A-90, A-55, B-90 and B-55 samples,
								as well as their transmittance spectra (inset). b) Energy bandgap
								(Eg) calculated by using the Tauc method.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf10.png"/>
					</fig>
				</p>
				<p>The energy band gap (Eg) was calculated using the Tauc relation [<xref
						ref-type="bibr" rid="B27">27</xref>], resulting in values of 2.27 eV, 2.32
					eV, 2.43 eV and 2.52 eV for the A-90, A-55, B-90 and B-55 films, respectively
						(<xref ref-type="fig" rid="f10">Figure 10b</xref>).</p>
				<p>It appears that Eg was larger for lower deposition times, regardless of whether
					sodium citrate or ammonium chloride was used as a complexing agent. This is in
					agreement with the grain sizes obtained by XRD for the same samples. Regardless
					of deposition time, E<sub>g</sub> values were higher for the sodium citrate
					formulation than for the ammonium chloride formulation. The fact that
						E<sub>g</sub> became bigger with decreasing grain size can be explained in
					terms of quantum confinement effect that becomes stronger in nanostructured
					films [<xref ref-type="bibr" rid="B28">28</xref>].</p>
				<p>
					<xref ref-type="fig" rid="f11">Figure 11</xref> shows the absorbance spectrum of
					copper-doped CdS film as a function of T<sub>a</sub>. It can be seen that all
					samples had an absorption band centered at 490 nm, which was attributed to the
					surface plasmon of copper nanoparticles [<xref ref-type="bibr" rid="B29"
						>29</xref>] and is consistent with the presence of copper peaks shown in XRD
					results.</p>
				<p>
					<fig id="f11">
						<label>Figure 11</label>
						<caption>
							<title>a) Absorbance spectra of copper-doped CdS film as a function of
									T<sub>a</sub>. b) Energy bandgap (Eg) calculated by using the
								Tauc method.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf11.png"/>
					</fig>
				</p>
				<p>The plasmon absorption was most intense at T<sub>a</sub> = 140 °C, followed by
						T<sub>a</sub> = 170 °C, in agreement with the relative intensities of the
					XRD peaks associated with cubic Cu (<xref ref-type="fig" rid="f8">Figure
						8</xref>). The position of the plasmon band in the absorbance spectrum is
					consistent with the 13-nm grain size obtained from the XRD results above.</p>
				<p>The Eg of the B-90-T<sub>a</sub> films was calculated as a function of
						T<sub>a</sub> using the Tauc relation (<xref ref-type="fig" rid="f11">Figure
						11b</xref>). Eg resulted very similar for all T<sub>a</sub> values: 2.93 eV
					at 140 °C; 2.82 eV at 170 °C; 3.04 eV at 200 °C; and 2.90 eV at 230 °C. The
					average Eg was 2.92 eV, which is consistent with a CdS crystal lattice that
					expands when Cu is incorporated into it, but that still preserves its cubic
					phase [<xref ref-type="bibr" rid="B30">30</xref>].</p>
				<p>
					<xref ref-type="fig" rid="f12">Figure 12</xref> shows the photoluminescence
					spectra of CdS and Cu-doped CdS films. At first, it seems that the spectra of
					CdS films obtained from the sodium citrate formulation are similar to those
					obtained from the ammonium chloride formulation, since both present two wide
					emission bands in the ranges of 500 - 600 nm and 600 - 800 nm. However, a closer
					examination reveals that the band in the 500 - 600 nm region is asymmetric for
					the films prepared from ammonium chloride, but not for those prepared from
					sodium citrate. The band in the 600 - 800 nm region is also narrower when the
					ammonium chloride formulation is used. After deconvolution of the spectra, the
					films obtained from the ammonium sodium citrate formulation presented bands
					centered at 524 nm, 685 nm and 730 nm. The band centered within the energy
					chloride formulation presented emission bands centered at 543 nm, 580 nm and 670
					nm, while those obtained from the range of 2.28 - 2.37 eV (524 - 543 nm) was
					present for both formulations, corresponding to a band-to-band electronic
					transition, and could be attributed to the bandgap energy of each corresponding
					film [<xref ref-type="bibr" rid="B31">31</xref>,<xref ref-type="bibr" rid="B32"
						>32</xref>]. This is in agreement with the absorbance measurements presented
					above (<xref ref-type="fig" rid="f10">Figure 10</xref>). The PL emission band
					centered at 580 nm was attributed to electronic transition from donor energy
					states to valence band. Donor energy states moved into the energy gap due to the
					presence of interstitial cadmium (Cd<sub>i</sub>) [<xref ref-type="bibr"
						rid="B33">33</xref>,<xref ref-type="bibr" rid="B34">34</xref>]. The emission
					band centered within the 1.81 - 1.85 eV energy range (670 - 685 nm) was present
					for both formulations and was attributed to the presence of cadmium vacancies
						(V<sub>Cd</sub>), particularly with the electronic transition from the
					conduction band (CB) to V<sub>Cd</sub> [<xref ref-type="bibr" rid="B34"
						>34</xref>,<xref ref-type="bibr" rid="B35">35</xref>]. This transition could
					be assumed to take place in a range of 1.81 - 1.85 eV below the conduction band,
					implying that the V<sub>Cd</sub> states are located in a range of 0.47 - 0.71 eV
					above the valence band, which is reasonably consistent with earlier reports
						[<xref ref-type="bibr" rid="B36">36</xref>,<xref ref-type="bibr" rid="B37"
						>37</xref>]. The broad emission peak centered at 730 nm was attributed to
					the presence of sulfur vacancies (V<sub>s</sub>) [<xref ref-type="bibr"
						rid="B31">31</xref>,<xref ref-type="bibr" rid="B38">38</xref>]. The presence
					of the 730 nm band in the films synthesized with sodium citrate, and its absence
					in those obtained from ammonium chloride, indicate that sodium citrate, but not
					ammonium chloride, promotes the formation of Vs. On the other hand, the presence
					of the 580 nm band in the films synthesized with ammonium chloride and its
					absence in those obtained from sodium citrate indicate that ammonium chloride,
					but not sodium citrate, promotes the formation of Cd<sub>i</sub>.</p>
				<p>
					<fig id="f12">
						<label>Figure 12</label>
						<caption>
							<title>a) PL emission spectra of CdS films. b) PL emission spectra of
								Cu-doped CdS films as a function of T<sub>a</sub>.</title>
						</caption>
						<graphic xlink:href="1665-3521-sv-29-03-62-gf12.png"/>
					</fig>
				</p>
				<p>The relative intensity values of PL emission bands, corresponding to a
					band-to-band electronic transition and electronic transitions assisted by
					defects, show that using the ammonium chloride formulation resulted in CdS films
					with better optical quality (or a minor number of defects).</p>
				<p>
					<xref ref-type="fig" rid="f12">Figure 12b</xref> shows the PL emission spectra
					of the B-90-T<sub>a</sub> films as a function of T<sub>a</sub>. The spectra
					showed a blue shift of the peak associated with a band-to-band electronic
					transition, which is consistent with the absorbance measurements presented
					above, showing an increase in Eg when CdS films were doped with Cu (<xref
						ref-type="fig" rid="f11">Figure 11</xref>). Two points are also worth
					mentioning about the emission band associated with crystalline defects: 1) It
					only shows the V<sub>s</sub>-related emission and the V<sub>Cd</sub>-related
					emission disappears, which is consistent with the incorporation of Cu ions into
					Cd sites; and 2) Its relative intensity decreases, meaning that film optical
					quality increases with Cu doping. Only the film obtained by using T<sub>a</sub>
					= 200 °C showed the presence of VCd, although more studies are needed to clarify
					this finding since it was not the purpose of this study.</p>
			</sec>
		</sec>
		<sec sec-type="conclusions">
			<title>Conclusion</title>
			<p>Chemical bath deposition followed by thermal annealing resulted to be a good process
				to synthesize CdS:Cu thin films with an electrical resistivity of 5.822 ×
					10<sup>-5</sup> Ωcm, an average roughness of less than 9 nm, and an average
				thickness of 160 nm.</p>
			<p>The size of the particles making up the CdS:Cu film decreases as T<sub>a</sub>
				increases, starting at 160 nm at T<sub>a</sub> = 140 °C and reaching 10 nm at
					T<sub>a</sub> = 200 °C and higher temperatures.</p>
			<p>The formulation using sodium citrate as a complexing agent resulted better to obtain
				nanostructured films with homogeneous chemical composition and a roughness in the
				nanometric range. The films behaved as an n-type semiconductor with an energy gap of
				about 2.38 eV that varies only slightly with deposition time and the precursors'
				nature, but increases to 2.93 eV with Cu doping. The lowest resistivity obtained was
				that of the B-90-140 film, whose nanostructured nature was composed of cubic-phase
				nanocrystals smaller than 10 nm, contained V<sub>Cd</sub> and V<sub>S</sub> but not
					C<sub>di</sub>, and showed significant copper diffusion at 140 °C thermal
				annealing.</p>
			<p>The low resistivity of 5.822 × 10<sup>-5</sup> Ω cm obtained in this study results to
				be one of the lowest electrical resistivities reported for an n-type CdS film.</p>
		</sec>
	</body>
	<back>
		<ack>
			<title>Acknowledgments</title>
			<p>Authors wish to express their gratitude to the National Council of Science and
				Technology (CONACYT) for the PhD scholarships granted to: F. Javier S. Rodriguez and
				J. Angulo-Rocha, as well as to the Programa de Mejoramiento del Profesorado (PROMEP)
				of the Mexican Secretariat of Public Education (SEP) and the Programa de Fomento y
				Apoyo a Proyectos de Investigación (PROFAPI) of the Universidad Autónoma de Sinaloa
				(UAS) for the financial support of this research. They would also like to
				acknowledge the technical support of Omar Novelo, Adriana Tejeda and Zacarias
				Rivera.</p>
		</ack>
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